Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic apparatus comprising:
- an illumination system that conditions a beam of radiation;
an array of individually controllable elements that pattern the beam;
a beam divider that divides an intensity of the patterned beam into at least first and second fractions, each having substantially a complete cross-section of the pattern;
a projection system that projects the first fraction of the patterned beam onto a target portion of a substrate; and
an image sensor that inspects at least a portion of the cross-section of the second fraction of the patterned beam.
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Abstract
Lithographic apparatus using an array of individually controllable elements in which a fraction of the intensity of the beam of radiation patterned by the array of individually controllable elements is diverted to an image sensor for verifying the quality of the image generated.
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Citations
28 Claims
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1. A lithographic apparatus comprising:
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an illumination system that conditions a beam of radiation;
an array of individually controllable elements that pattern the beam;
a beam divider that divides an intensity of the patterned beam into at least first and second fractions, each having substantially a complete cross-section of the pattern;
a projection system that projects the first fraction of the patterned beam onto a target portion of a substrate; and
an image sensor that inspects at least a portion of the cross-section of the second fraction of the patterned beam. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27)
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28. A device manufacturing method, comprising:
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patterning a beam of radiation using array of individually controllable elements;
dividing an intensity of the patterned beam into at least first and second fractions, each of the first and second fractions having substantially a complete cross-section of the pattern;
projecting the first fraction of the patterned beam onto a target portion of a substrate; and
inspecting at least a portion of the cross-section of the second fraction of the patterned beam with an image sensor.
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Specification