×

Lithographic apparatus and device manufacturing method

  • US 20060082752A1
  • Filed: 10/18/2004
  • Published: 04/20/2006
  • Est. Priority Date: 10/18/2004
  • Status: Active Grant
First Claim
Patent Images

1. A lithographic apparatus comprising:

  • an illumination system that conditions a beam of radiation;

    an array of individually controllable elements that pattern the beam;

    a beam divider that divides an intensity of the patterned beam into at least first and second fractions, each having substantially a complete cross-section of the pattern;

    a projection system that projects the first fraction of the patterned beam onto a target portion of a substrate; and

    an image sensor that inspects at least a portion of the cross-section of the second fraction of the patterned beam.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×