Vacuum sealed surface acoustic wave pressure sensor
First Claim
1. A pressure sensor method, comprising the steps of:
- micro-machining a base from a first wafer;
micro-machining a cover from a second wafer, wherein said base and said cover form a vacuum seal therebetween; and
disposing a pressure sensing element within said vacuum between said base and said cover within said vacuum seal to form a vacuum sealed pressure sensor thereof.
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Accused Products
Abstract
A vacuum sealed SAW pressure sensor is disclosed herein, which includes a sensing element configured as a SAW device (e.g., SAW resonator or SAW delay line) supported by a thin diaphragm. The substrate material can be implemented as a quartz wafer (i.e., a “base” wafer). The SAW device can be configured on one side of the wafer and the diaphragm etched on the opposite side. A quartz micromachined pressure sensor can thus be realized, which operates based on a variation of the surface wave velocity of a SAW device situated on the thin diaphragm. The SAW sensor is generally sealed in a vacuum and diaphragm sustains the sensor, thereby implementing a sensor on a wafer scale while allowing for a cost reduction per chip.
44 Citations
21 Claims
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1. A pressure sensor method, comprising the steps of:
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micro-machining a base from a first wafer;
micro-machining a cover from a second wafer, wherein said base and said cover form a vacuum seal therebetween; and
disposing a pressure sensing element within said vacuum between said base and said cover within said vacuum seal to form a vacuum sealed pressure sensor thereof. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A pressure sensor method, comprising the steps of:
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micro-machining a base from a first wafer;
micro-machining a cover from a second wafer, by dry etching said wafer in order to form a plurality of grooves thereof, which are adaptable for use with at least one of the following;
a reference chamber, at least one over-pressure stop, and at least one trench subsequently formed upon said wafer, wherein said base and said cover form a vacuum seal between said base and said cover;
micro-machining a mechanical support from a third wafer to support said base and said cover, wherein said third wafer is bonded to said first and second wafers;
forming a diaphragm by micro-machining said first wafer to form said base upon which said diaphragm is located. configuring a pressure sensing element to comprise at least one surface acoustic wave device;
configuring said base to support said at least one surface acoustic wave device; and
disposing said pressure sensing element within said vacuum between said base and said cover within said vacuum seal to form a vacuum sealed pressure sensor thereof.
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19. A pressure sensor system, comprising:
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a base micro-machined from a first wafer;
a cover micro-machined from a second wafer, wherein said base and said cover form a vacuum seal therebetween; and
a pressure sensing element disposed within said vacuum between said base and said cover within said vacuum seal to form a vacuum sealed pressure sensor thereof. - View Dependent Claims (20, 21)
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Specification