Processing gas supply mechanism, film forming apparatus and method, and computer storage medium storing program for controlling same
First Claim
1. A processing gas supply mechanism, installed on a processing chamber of a film forming apparatus, for supplying a processing gas containing a metal organic compound gas onto a substrate to be processed loaded on a substrate supporting table disposed in the processing chamber, comprising:
- a processing gas inlet opening for introducing the processing gas;
a diffusion space for diffusing the processing gas introduced from the processing gas inlet opening;
a processing gas supply mechanism main body for forming the processing gas diffusion space; and
one or more processing gas supply holes for supplying the processing gas from the diffusion space to a processing space on the substrate to be processed in the processing chamber, wherein the processing gas supply holes are shaped to have a Peclet number of 0.5 to 2.5 when the processing gas passes therethrough.
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Accused Products
Abstract
A processing gas supply mechanism installed on a processing chamber of a film forming apparatus for supplying a processing gas containing a metal organic compound onto a substrate to be processed includes a processing gas inlet opening for introducing the processing gas, a diffusion space for diffusing the processing gas introduced from the processing gas inlet opening, a processing gas supply mechanism main body for forming the processing gas diffusion space, and one or more processing gas supply holes for supplying the processing gas from the diffusion space to a processing space on the substrate in the processing chamber. Further, the processing gas supply holes are shaped to have a Peclet number of 0.5 to 2.5 when the processing gas passes therethrough.
292 Citations
20 Claims
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1. A processing gas supply mechanism, installed on a processing chamber of a film forming apparatus, for supplying a processing gas containing a metal organic compound gas onto a substrate to be processed loaded on a substrate supporting table disposed in the processing chamber, comprising:
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a processing gas inlet opening for introducing the processing gas;
a diffusion space for diffusing the processing gas introduced from the processing gas inlet opening;
a processing gas supply mechanism main body for forming the processing gas diffusion space; and
one or more processing gas supply holes for supplying the processing gas from the diffusion space to a processing space on the substrate to be processed in the processing chamber, wherein the processing gas supply holes are shaped to have a Peclet number of 0.5 to 2.5 when the processing gas passes therethrough. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A film forming apparatus comprising:
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a processing chamber;
a substrate supporting table, disposed in the processing chamber, for supporting a substrate to be processed;
an exhaust port for evacuating the processing chamber; and
a processing gas supply mechanism, disposed on the processing chamber, for supplying a processing gas containing a metal organic compound onto the substrate to be processed, wherein the processing gas supply mechanism includes;
a processing gas inlet opening for introducing the processing gas;
a diffusion space for diffusing the processing gas introduced from the processing gas inlet opening;
a processing gas supply mechanism main body for forming the diffusion space; and
one or more processing gas supply holes for supplying the processing gas from the diffusion space to a processing space on the substrate to be processed in the processing chamber, wherein the processing gas supply holes are shaped to have a Peclet number of 0.5 to 2.5 when the processing gas passes therethrough. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15)
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16. A method for forming a film on a substrate to be processed by using a film forming apparatus, the film forming apparatus including:
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a processing chamber;
a substrate supporting table, disposed in the processing chamber, for supporting a substrate to be processed;
an exhaust port for evacuating the processing chamber; and
a processing gas supply mechanism, disposed on the processing chamber, for supplying a processing gas containing a metal organic compound onto the substrate to be processed, wherein the processing gas supply mechanism includes;
a processing gas inlet opening for introducing the processing gas;
a diffusion space for diffusing the processing gas introduced from the processing gas inlet opening;
a processing gas supply mechanism main body for forming the diffusion space; and
one or more processing gas supply holes for supplying the processing gas from the diffusion space into a processing space on the substrate to be processed in the processing chamber, the method, comprising;
a processing gas supplying process for supplying the processing gas to the processing space, wherein the processing gas supplying process includes a process where a Peclet number is 0.5 and 2.5 when the processing gas passes through the processing gas supply holes. - View Dependent Claims (17, 18, 19)
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20. A processing apparatus for processing a substrate by using a processing gas, comprising:
a gas supply mechanism having a plurality of gas supply holes, wherein the gas supply holes are shaped to have a Peclet number of 0.5 to 2.5 when the processing gas passes therethrough.
Specification