Substrate conveyor apparatus, substrate conveyance method and exposure apparatus

• US 20060087638A1
• Filed: 09/27/2005
• Published: 04/27/2006
• Est. Priority Date: 10/26/2004
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Hirayanagi, Noriyuki
• Granted Patent: US 7,483,123 B2
• Time in Patent Office: Days
• US Class Current: 355/72
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: G03F 1/24 Reflection masks; Preparation thereof
• CPC Class Codes: G03F 1/48 Protective coatings
• CPC Class Codes: G03F 1/62 Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
• CPC Class Codes: G03F 1/66 Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
• CPC Class Codes: G03F 7/70741 Handling masks outside exposure position, e.g. reticle libraries
• CPC Class Codes: G03F 7/7075 Handling workpieces outside exposure position, e.g. SMIF box
• CPC Class Codes: G03F 7/70908 Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
• CPC Class Codes: G03F 7/70983 Optical system protection, e.g. pellicles or removable covers for protection of mask
• CPC Class Codes: H01L 21/67196 characterized by the construction of the transfer chamber
• CPC Class Codes: H01L 21/67225 comprising at least one lithography chamber lithographic apparatuses G03F7/00
• CPC Class Codes: H01L 21/67742 Mechanical parts of transfer devices robots in general in B25J

Abstract

With respect to a substrate conveyor apparatus that, being a substrate conveyor apparatus that carries substrates on which patterns are formed, carries the substrates in a state protected by a protective cover when the substrate is not used, a substrate conveyor apparatus having a cover protection means that conceals the inner surface of the protective cover when the substrate is used.

Claims

1. With respect to a substrate conveyor apparatus that, being a substrate conveyor apparatus that carries substrates on which patterns are formed, carries the substrates in a state protected by a protective cover when the substrate is not used, a substrate conveyor apparatus characterized by having a cover protection means that conceals the inner surface of the protective cover when the substrate is used.

2. With respect to a substrate conveyor apparatus described in claim 1, a substrate conveyor apparatus characterized in that the cover protection means conceals the inner surface of the protective cover when the substrate is used in exposure.

3. With respect to a substrate conveyor apparatus described in claim 1, a substrate conveyor apparatus characterized in that the protective cover comprises a plurality of cover members disposed so as to conceal the substrate and to be attachable and removable, and the cover protection means holds the plurality of cover members in a closed state in a standby position.

4. With respect to a substrate conveyor apparatus described in claim 3, a substrate conveyor apparatus characterized in that the cover protection means, after carrying the substrate along with one part of the plurality of cover members to the substrate exposure position, returns the one part of the cover members to the standby position and brings the plurality of cover members into a closed state.

5. With respect to a substrate conveyor apparatus described in claim 3, a substrate conveyor apparatus characterized in that the closed state of the plurality of cover members is a state in which the plurality of cover members is sealed.

6. With respect to a substrate conveyor apparatus described in claim 1,

a substrate conveyor-apparatus characterized in that the protective cover comprises a cover member disposed so as to conceal the substrate and to be attachable and removable, and the cover protection means holds the cover member in a standby position in a state mounted to an imitation member that imitates the shape of the substrate.

7. With respect to a substrate conveyor apparatus described in claim 3, a substrate conveyor apparatus characterized in that the standby position is a position that performs alignment of the substrate.

8. With respect to a substrate conveyor apparatus described in claim 3, a substrate conveyor apparatus characterized in that the standby position is a position wherein the cover member is removed from the substrate.

9. With respect to a substrate conveyor apparatus described in claim 3, a substrate conveyor apparatus characterized in that the standby position is a library part that stores the substrate in an exposure environment.

10. With respect to a substrate conveyor apparatus described in claim 3, a substrate conveyor apparatus characterized in that the protective cover is grounded at the standby position.

11. With respect to a substrate conveyor apparatus described in claim 6, a substrate conveyor apparatus characterized in that the standby position is a position that performs alignment of the substrate.

12. With respect to a substrate conveyor apparatus described in claim 6, a substrate conveyor apparatus characterized in that the standby position is a position wherein the cover member is removed from the substrate.

13. With respect to a substrate conveyor apparatus described in claim 6, a substrate conveyor apparatus characterized in that the standby position is a library part that stores the substrate in an exposure environment.

14. With respect to a substrate conveyor apparatus described in claim 6, a substrate conveyor apparatus characterized in that the protective cover is grounded at the standby position.

19. An exposure apparatus characterized by having a substrate conveyor apparatus described in claim 1.

15. With respect to a substrate conveyor apparatus that, being a substrate conveyor apparatus that carries substrates on which patterns are formed, carries the substrates in a state protected by a protective cover when the substrate is not used, a substrate conveyor apparatus characterized by having a grounding means that grounds the substrate or the protective cover.

16. With respect to a substrate conveyor apparatus described in claim 15, a substrate conveyor apparatus characterized in that the grounding means is provided on the setting machine that sets the substrate or the protective cover.

17. With respect to a substrate conveyor apparatus described in claim 15, a substrate conveyor apparatus characterized in that the substrate is grounded via the protective cover.

20. An exposure apparatus characterized by having a substrate conveyor apparatus described in claim 15.

18. With respect to a substrate conveyance method that, being a substrate conveyance method that carries substrates on which patterns are formed, carries the substrates in a state protected by a protective cover when the substrate is not used, a substrate conveyance method characterized by holding the protective cover on standby so that the inner surface of the protective cover is concealed when the substrate is used.

21. An exposure apparatus characterized by having a substrate conveyor apparatus described in claim 18.