Transmission mask with differential attenuation to improve ISO-dense proximity
First Claim
1. A method of imaging patterns in a photolithography process, comprising:
- effectuating a light exposure of a photoresist material to create therein a first pattern of features having a first feature density, including imposing a first amount of attenuation on light produced by a light source; and
effectuating a light exposure of the photoresist material to create therein a second pattern of features having a second feature density which differs from said first a feature density, including imposing on light produced by the light source a second amount of attenuation that differs from said first amount of attenuation.
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Abstract
An apparatus, system and method to compensate for the proximity effects in the imaging of patterns in a photolithography process. A light exposure of a photoresist layer is effectuated in predetermined patterns through an exposure mask having light-transmissive openings in correspondence to the predetermined patterns. The exposure mask has areas densely populated with the light-transmissive openings and areas sparsely populated with the light-transmissive openings. Light is attenuated through the densely populated light-transmissive openings by a different amount than through the sparsely populated light-transmissive openings.
7 Citations
6 Claims
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1. A method of imaging patterns in a photolithography process, comprising:
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effectuating a light exposure of a photoresist material to create therein a first pattern of features having a first feature density, including imposing a first amount of attenuation on light produced by a light source; and
effectuating a light exposure of the photoresist material to create therein a second pattern of features having a second feature density which differs from said first a feature density, including imposing on light produced by the light source a second amount of attenuation that differs from said first amount of attenuation. - View Dependent Claims (2, 3, 4, 5, 6)
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Specification