Plasma processing apparatus, abnormal discharge detecting method for the same, program for implementing the method, and storage medium storing the program
First Claim
1. A plasma processing apparatus comprising:
- a chamber that houses a substrate;
at least one electrode that is disposed inside said chamber, for applying a high-frequency electric power inside said chamber;
piping that introduces processing gas into said chamber;
a potential fluctuation detecting device that detects fluctuations in potential;
an ultrasonic detecting device that detects ultrasonic waves; and
an abnormal discharge determining device operable when both the fluctuations in potential and the ultrasonic waves are detected in substantially the same timing, to determine that abnormal discharge has occurred.
1 Assignment
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Accused Products
Abstract
A plasma processing apparatus that is capable of accurately detecting abnormal discharge. A chamber 10 houses a semiconductor wafer W. A susceptor 11 which functions as a lower electrode and a showerhead 33 which functions as an upper electrode are disposed inside the chamber 10, for applying a high-frequency electric power inside the chamber 10. Processing gas supply piping 38 introduces a processing gas into the chamber 10. A potential probe 50 detects fluctuations in potential. An ultrasonic sensor 41 detects ultrasonic waves. A CPU of a PC 52 determines that abnormal discharge has occurred when both the fluctuations in potential and the ultrasonic waves are detected in the same timing.
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Citations
13 Claims
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1. A plasma processing apparatus comprising:
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a chamber that houses a substrate;
at least one electrode that is disposed inside said chamber, for applying a high-frequency electric power inside said chamber;
piping that introduces processing gas into said chamber;
a potential fluctuation detecting device that detects fluctuations in potential;
an ultrasonic detecting device that detects ultrasonic waves; and
an abnormal discharge determining device operable when both the fluctuations in potential and the ultrasonic waves are detected in substantially the same timing, to determine that abnormal discharge has occurred. - View Dependent Claims (2, 3, 4, 5)
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6. A plasma processing apparatus comprising:
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a chamber that houses a substrate;
at least one electrode that is disposed inside said chamber, for applying a high-frequency electric power inside said chamber;
piping that introduces processing gas into said chamber;
a light emission fluctuation detecting device that detects fluctuations in intensity of light emission inside said chamber;
an ultrasonic detecting device that detects ultrasonic waves; and
an abnormal discharge determining device operable when both the fluctuations in intensity of light emission and the ultrasonic waves are detected in substantially the same timing, to determine that abnormal discharge has occurred. - View Dependent Claims (7)
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8. An abnormal discharge detecting method for a plasma processing apparatus including a chamber that houses a substrate, at least one electrode that is disposed inside the chamber, for applying a high-frequency electric power inside the chamber, and piping that introduces processing gas into the chamber, the method comprising:
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a potential fluctuation detecting step of detecting fluctuations in potential;
an ultrasonic detecting step of detecting ultrasonic waves; and
an abnormal discharge determining step of determining that abnormal discharge has occurred when both the fluctuations in potential and the ultrasonic waves are detected in substantially the same timing.
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9. An abnormal discharge detecting method for a plasma processing apparatus including a chamber that houses a substrate, at least one electrode that is disposed inside the chamber, for applying a high-frequency electric power inside the chamber, and piping that introduces processing gas into the chamber, the method comprising:
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a light emission fluctuation detecting step of detecting fluctuations in intensity of light emission inside the chamber;
an ultrasonic detecting step of detecting ultrasonic waves; and
an abnormal discharge determining step of determining that abnormal discharge has occurred when both the fluctuations in intensity of light emission and the ultrasonic waves are detected in substantially the same timing.
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10. A program for causing a computer to implement an abnormal discharge detecting method for a plasma processing apparatus including a chamber that houses a substrate, at least one electrode that is disposed inside the chamber, for applying a high-frequency electric power inside the chamber, and piping that introduces processing gas into the chamber, the program comprising:
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a potential fluctuation detecting module for detecting fluctuations in potential;
an ultrasonic detecting module for detecting ultrasonic waves; and
an abnormal discharge determining module of determining that abnormal discharge has occurred when both the fluctuations in potential and the ultrasonic waves are detected in substantially the same timing.
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11. A program for causing a computer to implement an abnormal discharge detecting method for a plasma processing apparatus including a chamber that houses a substrate, at least one electrode that is disposed inside the chamber, for applying a high-frequency electric power inside the chamber, and piping that introduces processing gas into the chamber, the program comprising:
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a light emission fluctuation detecting module for detecting fluctuations in intensity of light emission inside the chamber;
an ultrasonic detecting module for detecting ultrasonic waves; and
an abnormal discharge determining module of determining that abnormal discharge has occurred when both the fluctuations in intensity of light emission and the ultrasonic waves are detected in substantially the same timing.
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12. A computer-readable storage medium storing a program for causing a computer to implement an abnormal discharge detecting method for a plasma processing apparatus including a chamber that houses a substrate, at least one electrode that is disposed inside the chamber, for applying a high-frequency electric power inside the chamber, and piping that introduces processing gas into the chamber, the program comprising:
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a potential fluctuation detecting module for detecting fluctuations in potential;
an ultrasonic detecting module for detecting ultrasonic waves; and
an abnormal discharge determining module of determining-that abnormal discharge has occurred when both the fluctuations in potential and the ultrasonic waves are detected in substantially the same timing.
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13. A computer-readable storage medium storing a program for causing a computer to implement an abnormal discharge detecting method for a plasma processing apparatus including a chamber that houses a substrate, at least one electrode that is disposed inside the chamber, for applying a high-frequency electric power inside the chamber, and piping that introduces processing gas into the chamber, the program comprising:
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a light emission fluctuation detecting module for detecting fluctuations in intensity of light emission inside the chamber;
an ultrasonic detecting module for detecting ultrasonic waves; and
an abnormal discharge determining module of determining that abnormal discharge has occurred when both the fluctuations in intensity of light emission and the ultrasonic waves are detected in substantially the same timing.
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Specification