Plasma processing apparatus, abnormal discharge detecting method for the same, program for implementing the method, and storage medium storing the program

• US 20060100824A1
• Filed: 10/27/2005
• Published: 05/11/2006
• Est. Priority Date: 10/27/2004
• Status: Abandoned Application

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Moriya, Tsuyoshi
• Application Number:
  US11/259,038
• Publication Number:
  US 20060100824A1
• Time in Patent Office: Days
• US Class Current: 702/183
• CPC Class Codes: H01J 2237/0206 Extinguishing, preventing or controlling unwanted discharges
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge

Abstract

A plasma processing apparatus that is capable of accurately detecting abnormal discharge. A chamber 10 houses a semiconductor wafer W. A susceptor 11 which functions as a lower electrode and a showerhead 33 which functions as an upper electrode are disposed inside the chamber 10, for applying a high-frequency electric power inside the chamber 10. Processing gas supply piping 38 introduces a processing gas into the chamber 10. A potential probe 50 detects fluctuations in potential. An ultrasonic sensor 41 detects ultrasonic waves. A CPU of a PC 52 determines that abnormal discharge has occurred when both the fluctuations in potential and the ultrasonic waves are detected in the same timing.

Claims

1. A plasma processing apparatus comprising:

a chamber that houses a substrate;

at least one electrode that is disposed inside said chamber, for applying a high-frequency electric power inside said chamber;

piping that introduces processing gas into said chamber;

a potential fluctuation detecting device that detects fluctuations in potential;

an ultrasonic detecting device that detects ultrasonic waves; and

an abnormal discharge determining device operable when both the fluctuations in potential and the ultrasonic waves are detected in substantially the same timing, to determine that abnormal discharge has occurred.

2. A plasma processing apparatus according to claim 1, wherein said ultrasonic detecting device comprises a first ultrasonic detecting device disposed on a side surface of said piping, and a second ultrasonic detecting device disposed an outside wall of said chamber.

3. A plasma processing apparatus according to claim 1, further comprising a power supply rod that is connected to said electrode, for supplying the high-frequency electric power to said electrode, and

wherein said ultrasonic detecting device is provided on said power supply rod.

4. A plasma processing apparatus according to claim 1, wherein said potential fluctuation detecting device includes a high-frequency component removing device that removes high-frequency components of a voltage induced by the fluctuations in potential.

5. A plasma processing apparatus according to claim 1, wherein said potential fluctuation detecting device and said ultrasonic detecting device are integrated.

6. A plasma processing apparatus comprising:

a chamber that houses a substrate;

at least one electrode that is disposed inside said chamber, for applying a high-frequency electric power inside said chamber;

piping that introduces processing gas into said chamber;

a light emission fluctuation detecting device that detects fluctuations in intensity of light emission inside said chamber;

an ultrasonic detecting device that detects ultrasonic waves; and

an abnormal discharge determining device operable when both the fluctuations in intensity of light emission and the ultrasonic waves are detected in substantially the same timing, to determine that abnormal discharge has occurred.

7. A plasma processing apparatus according to claim 6, wherein said light emission fluctuation detecting device detects fluctuations in total light emission intensity inside said chamber.

8. An abnormal discharge detecting method for a plasma processing apparatus including a chamber that houses a substrate, at least one electrode that is disposed inside the chamber, for applying a high-frequency electric power inside the chamber, and piping that introduces processing gas into the chamber, the method comprising:

a potential fluctuation detecting step of detecting fluctuations in potential;

an ultrasonic detecting step of detecting ultrasonic waves; and

an abnormal discharge determining step of determining that abnormal discharge has occurred when both the fluctuations in potential and the ultrasonic waves are detected in substantially the same timing.

9. An abnormal discharge detecting method for a plasma processing apparatus including a chamber that houses a substrate, at least one electrode that is disposed inside the chamber, for applying a high-frequency electric power inside the chamber, and piping that introduces processing gas into the chamber, the method comprising:

a light emission fluctuation detecting step of detecting fluctuations in intensity of light emission inside the chamber;

an ultrasonic detecting step of detecting ultrasonic waves; and

an abnormal discharge determining step of determining that abnormal discharge has occurred when both the fluctuations in intensity of light emission and the ultrasonic waves are detected in substantially the same timing.

10. A program for causing a computer to implement an abnormal discharge detecting method for a plasma processing apparatus including a chamber that houses a substrate, at least one electrode that is disposed inside the chamber, for applying a high-frequency electric power inside the chamber, and piping that introduces processing gas into the chamber, the program comprising:

a potential fluctuation detecting module for detecting fluctuations in potential;

an ultrasonic detecting module for detecting ultrasonic waves; and

an abnormal discharge determining module of determining that abnormal discharge has occurred when both the fluctuations in potential and the ultrasonic waves are detected in substantially the same timing.

11. A program for causing a computer to implement an abnormal discharge detecting method for a plasma processing apparatus including a chamber that houses a substrate, at least one electrode that is disposed inside the chamber, for applying a high-frequency electric power inside the chamber, and piping that introduces processing gas into the chamber, the program comprising:

a light emission fluctuation detecting module for detecting fluctuations in intensity of light emission inside the chamber;

an ultrasonic detecting module for detecting ultrasonic waves; and

an abnormal discharge determining module of determining that abnormal discharge has occurred when both the fluctuations in intensity of light emission and the ultrasonic waves are detected in substantially the same timing.

12. A computer-readable storage medium storing a program for causing a computer to implement an abnormal discharge detecting method for a plasma processing apparatus including a chamber that houses a substrate, at least one electrode that is disposed inside the chamber, for applying a high-frequency electric power inside the chamber, and piping that introduces processing gas into the chamber, the program comprising:

a potential fluctuation detecting module for detecting fluctuations in potential;

an ultrasonic detecting module for detecting ultrasonic waves; and

an abnormal discharge determining module of determining-that abnormal discharge has occurred when both the fluctuations in potential and the ultrasonic waves are detected in substantially the same timing.

13. A computer-readable storage medium storing a program for causing a computer to implement an abnormal discharge detecting method for a plasma processing apparatus including a chamber that houses a substrate, at least one electrode that is disposed inside the chamber, for applying a high-frequency electric power inside the chamber, and piping that introduces processing gas into the chamber, the program comprising:

a light emission fluctuation detecting module for detecting fluctuations in intensity of light emission inside the chamber;

an ultrasonic detecting module for detecting ultrasonic waves; and

an abnormal discharge determining module of determining that abnormal discharge has occurred when both the fluctuations in intensity of light emission and the ultrasonic waves are detected in substantially the same timing.