Substrate processing container
First Claim
1. A substrate processing vessel for processing therein a substrate with a processing fluid, comprising:
- a vessel body;
a cover adapted to be separatably and hermetically joined to the vessel body to define a processing space together with the vessel body;
a plurality of substrate support rods incorporated into the vessel body; and
a driving device adapted to vertically move the substrate support rods between a first vertical position and a second vertical position;
wherein each of the substrate support rods has a head adapted to support a substrate from below the same, and a shank extending downward from the head, the vessel body is provided with a plurality of vertical bores each having an open upper end opening into the processing space, and the shanks of the substrate support rods are vertically movably inserted in the bores, respectively, the head of each substrate support rod is sized such that the head is unable to pass through the bore of the vessel body, and the heads of the substrate support rods are configured to close the open upper ends of the bores when the substrate support rods are held at the first vertical position.
1 Assignment
0 Petitions
Accused Products
Abstract
A substrate processing vessel has a vessel body 100 and a cover 130 hermetically joined to the vessel body 100. The vessel body 100 is provided with a plurality of substrate support rods 102. Each of the support rods 102 has a shank 103 and a head 104 having a diameter greater than that of the shank 103 and attached to the upper end of the shank 103. The shanks 103 penetrate the vessel body 100 and project downward from the vessel body 100. When each substrate support rod 102 is lowered to its lower position, the head 104 is seated hermetically on a part, around the open upper end of a through hole 108 through which the shank 103 is inserted, of the vessel body 100. When each substrate support rod 102 is raised to its upper position, a space of a big thickness capable of receiving a wafer carrying arm 14a is formed between the upper surface of the vessel body 100 and a wafer W supported on the substrate support rods 102. A processing space defined by the substrate processing vessel may be very thin, the amount of a processing fluid necessary for processing the wafer W can be reduced and throughput can be increased.
27 Citations
16 Claims
-
1. A substrate processing vessel for processing therein a substrate with a processing fluid, comprising:
-
a vessel body;
a cover adapted to be separatably and hermetically joined to the vessel body to define a processing space together with the vessel body;
a plurality of substrate support rods incorporated into the vessel body; and
a driving device adapted to vertically move the substrate support rods between a first vertical position and a second vertical position;
wherein each of the substrate support rods has a head adapted to support a substrate from below the same, and a shank extending downward from the head, the vessel body is provided with a plurality of vertical bores each having an open upper end opening into the processing space, and the shanks of the substrate support rods are vertically movably inserted in the bores, respectively, the head of each substrate support rod is sized such that the head is unable to pass through the bore of the vessel body, and the heads of the substrate support rods are configured to close the open upper ends of the bores when the substrate support rods are held at the first vertical position. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
-
Specification