Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic apparatus for projecting a pattern onto a substrate, the apparatus comprising:
- a patterning array of individually controllable elements that pattern a beam by selectively diverting incident radiation between a first optical path leading to a target portion of the substrate and a second optical path not leading to the substrate; and
a detector sensitive to the radiation provided in the second optical path.
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Abstract
In a maskless lithography apparatus light deflected by a patterning array out of a path towards a substrate is directed onto a detector that detects malfunctions of the patterning array. If the patterning array is of a type which selectively diverts radiation in order to pattern the beam, the detector can use the radiation that is diverted out of the beam. Alternatively, a second beam of radiation, additional to the exposure radiation, can be provided.
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Citations
21 Claims
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1. A lithographic apparatus for projecting a pattern onto a substrate, the apparatus comprising:
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a patterning array of individually controllable elements that pattern a beam by selectively diverting incident radiation between a first optical path leading to a target portion of the substrate and a second optical path not leading to the substrate; and
a detector sensitive to the radiation provided in the second optical path. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A lithographic apparatus for projecting a pattern onto a substrate, the apparatus comprising:
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a patterning array of individually controllable elements;
a first illumination system that directs a first beam of radiation onto the patterning array of individually controllable elements, the patterning array of individually controllable elements patterning the first beam with a first pattern;
a second illumination system that directs a second beam of radiation onto the patterning array of individually controllable elements from a different direction, the patterning array of individually controllable elements patterning the second beam with a second pattern that is a complement of the first pattern;
a projection system that projects the first beam onto a target portion of the substrate; and
a detector that receives, and is sensitive to, radiation from the second beam deflected by the patterning array. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A device manufacturing method comprising:
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patterning a beam of radiation with a pattering array of individually controllable elements by selectively diverting incident radiation between a first optical path leading to a target portion of a substrate and a second optical path leading away from the substrate; and
detecting the diverted incident radiation in the second optical path to detect any malfunction of the patterning array.
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21. A device manufacturing method comprising:
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directing first and second beams of radiation onto a patterning array of individually controllable elements that pattern the beams, the beams being directed onto the patterning array of individually controllable elements from different directions, such that they are patterned with complementary patterns;
projecting the first beam of radiation onto a target portion of a substrate; and
detecting any malfunction of the patterning array using a detector provided in the path of the second beam.
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Specification