Probe arrays and method for making

• US 20060108678A1
• Filed: 06/30/2005
• Published: 05/25/2006
• Est. Priority Date: 05/07/2002
• Status: Abandoned Application

• Current Assignee: Microfabrica Incorporated (Technoprobe S.P.A.)
• Original Assignee: Microfabrica Incorporated (Technoprobe S.P.A.)
• Inventors: Zhang, Gang, Cohen, Adam L., Lockard, Michael S., Arat, Vacit, Kim, Kieun, Bang, Christopher A., Kruglick, Ezekiel J. J., Frodis, Uri, Chen, Richard T., Thompson, Jeffrey A., Kumar, Ananda H., Lembrikov, Pavel B.
• Application Number:
  US11/173,241
• Publication Number:
  US 20060108678A1
• Time in Patent Office: Days
• US Class Current: 257/690
• CPC Class Codes: B23K 35/0222 for use in soldering, brazing B23K35/0205 takes precedence
• CPC Class Codes: C23C 18/1605 by masking
• CPC Class Codes: C23C 18/1651 Two or more layers only obtained by electroless plating
• CPC Class Codes: C25D 1/003 3D structures, e.g. superposed patterned layers
• CPC Class Codes: C25D 1/12 by electrophoresis
• CPC Class Codes: G01R 1/06744 Microprobes, i.e. having dimensions as IC details
• CPC Class Codes: G01R 1/07307 with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
• CPC Class Codes: G01R 1/07314 the body of the probe being perpendicular to test object, e.g. bed of nails or probe with bump contacts on a rigid support on an elastic support, e.g. a film, G01R1/0735
• CPC Class Codes: G01R 3/00 Apparatus or processes specially adapted for the manufacture or maintenance of measuring instruments , e.g. of probe tips
• CPC Class Codes: H01L 21/6835 using temporarily an auxiliary support
• CPC Class Codes: H01L 2221/68313 Auxiliary support including a cavity for storing a finished device, e.g. IC package, or a partly finished device, e.g. die, during manufacturing or mounting
• CPC Class Codes: H01L 2221/68354 used to support diced chips prior to mounting
• CPC Class Codes: H01L 2221/68363 used in a transfer process involving transfer directly from an origin substrate to a target substrate without use of an intermediate handle substrate
• CPC Class Codes: H01L 2224/0401 Bonding areas specifically adapted for bump connectors, e.g. under bump metallisation [UBM]
• CPC Class Codes: H01L 2224/05552 in top view
• CPC Class Codes: H01L 2224/05568 the whole external layer protruding from the surface
• CPC Class Codes: H01L 2224/10126 Bump collar
• CPC Class Codes: H01L 2224/1147 using a lift-off mask
• CPC Class Codes: H01L 2224/11831 involving a chemical process, e.g. etching the bump connector
• CPC Class Codes: H01L 2224/1184 involving a mechanical process, e.g. planarising the bump connector
• CPC Class Codes: H01L 2224/1191 : Forming a passivation layer after forming the bump connector
• CPC Class Codes: H01L 2224/13017 : being non uniform along the bump connector
• CPC Class Codes: H01L 2224/13018 : comprising protrusions or indentations
• CPC Class Codes: H01L 2224/13076 : being mutually engaged together, e.g. through inserts
• CPC Class Codes: H01L 2224/13099 : Material
• CPC Class Codes: H01L 2224/131 : with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
• CPC Class Codes: H01L 2224/1403 : Bump connectors having different sizes, e.g. different diameters, heights or widths
• CPC Class Codes: H01L 2224/29099 : Material
• CPC Class Codes: H01L 2224/81001 : involving a temporary auxiliary member not forming part of the bonding apparatus
• CPC Class Codes: H01L 2224/81054 : Composition of the atmosphere
• CPC Class Codes: H01L 2224/81136 : involving guiding structures, e.g. spacers or supporting members
• CPC Class Codes: H01L 2224/8121 : using a reflow oven
• CPC Class Codes: H01L 2224/8181 : involving forming an intermetallic compound at the bonding interface
• CPC Class Codes: H01L 2224/81815 : Reflow soldering
• CPC Class Codes: H01L 24/11 : Manufacturing methods for bumps on insulating substrates H01L21/4853
• CPC Class Codes: H01L 24/12 : Structure, shape, material or disposition of the bump connectors prior to the connecting process
• CPC Class Codes: H01L 24/16 : of an individual bump connector
• CPC Class Codes: H01L 24/81 : using a bump connector
• CPC Class Codes: H01L 24/95 : at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
• CPC Class Codes: H01L 2924/00 : Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/00012 : Relevant to the scope of the group, the symbol of which is combined with the symbol of this group
• CPC Class Codes: H01L 2924/00013 : Fully indexed content
• CPC Class Codes: H01L 2924/0002 : Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
• CPC Class Codes: H01L 2924/01004 : Beryllium [Be]
• CPC Class Codes: H01L 2924/01005 : Boron [B]
• CPC Class Codes: H01L 2924/01006 : Carbon [C]
• CPC Class Codes: H01L 2924/01013 : Aluminum [Al]
• CPC Class Codes: H01L 2924/01015 : Phosphorus [P]
• CPC Class Codes: H01L 2924/0102 : Calcium [Ca]
• CPC Class Codes: H01L 2924/01022 : Titanium [Ti]
• CPC Class Codes: H01L 2924/01024 : Chromium [Cr]
• CPC Class Codes: H01L 2924/01027 : Cobalt [Co]
• CPC Class Codes: H01L 2924/01029 : Copper [Cu]
• CPC Class Codes: H01L 2924/01033 : Arsenic [As]
• CPC Class Codes: H01L 2924/01045 : Rhodium [Rh]
• CPC Class Codes: H01L 2924/01047 : Silver [Ag]
• CPC Class Codes: H01L 2924/01049 : Indium [In]
• CPC Class Codes: H01L 2924/0105 : Tin [Sn]
• CPC Class Codes: H01L 2924/01073 : Tantalum [Ta]
• CPC Class Codes: H01L 2924/01074 : Tungsten [W]
• CPC Class Codes: H01L 2924/01075 : Rhenium [Re]
• CPC Class Codes: H01L 2924/01078 : Platinum [Pt]
• CPC Class Codes: H01L 2924/01079 : Gold [Au]
• CPC Class Codes: H01L 2924/01082 : Lead [Pb]
• CPC Class Codes: H01L 2924/01322 : Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
• CPC Class Codes: H01L 2924/01327 : Intermediate phases, i.e. intermetallics compounds
• CPC Class Codes: H01L 2924/014 : Solder alloys
• CPC Class Codes: H01L 2924/09701 : Low temperature co-fired ceramic [LTCC]
• CPC Class Codes: H01L 2924/10253 : Silicon [Si]
• CPC Class Codes: H01L 2924/14 : Integrated circuits
• CPC Class Codes: H01L 2924/1461 : MEMS
• CPC Class Codes: H01L 2924/19041 : being a capacitor
• CPC Class Codes: H01L 2924/19042 : being an inductor
• CPC Class Codes: H01L 2924/19043 : being a resistor
• CPC Class Codes: H01L 2924/30107 : Inductance
• CPC Class Codes: H01L 2924/3011 : Impedance
• CPC Class Codes: H01L 2924/3025 : Electromagnetic shielding
• CPC Class Codes: H01L 2924/3651 : Formation of intermetallics
• CPC Class Codes: H01L 2924/3841 : Solder bridging

Abstract

Embodiments of invention are directed to the formation of microprobes (i.e. compliant electrical or electronic contact elements) on a temporary substrate, dicing individual probe arrays, and then transferring the arrays to space transformers or other permanent substrates. Some embodiments of the invention transfer probes to permanent substrates prior to separating the probes from a temporary substrate on which the probes were formed while other embodiments do the opposite. Some embodiments, remove sacrificial material prior to transfer while other embodiments remove sacrificial material after transfer. Some embodiments are directed to the bonding of first and second electric components together using one or more solder bumps with enhanced aspect ratios (i.e. height to width ratios) obtained as a result of surrounding the bumps at least in part with rings of a retention material. The retention material may act be a solder mask material.

Claims

1. A method for fabricating a microprobe array, comprising:

fabricating at least a portion of each of a plurality of probes on a temporary substrate;

transferring the probes from the temporary substrate to a permanent substrate.

2. The method of claim 1, wherein at least selected groups of probes on the temporary substrate have a spatial relationship that is to be maintained when they are transferred to the permanent substrate.

3. The method of claim 2 wherein a selectively located adhesion material is located on the permanent substrate in locations where probes of a selected group are to be attached.

4. The method of claim 2 wherein a selectively located adhesion material is located on an end of the probes after they are formed on the temporary substrate and thereafter the probes are transferred to the permanent substrate.

5. The method of claim 2 wherein a selectively located adhesion material is located on the permanent substrate in locations where probes of a selected group are to be attached and wherein a selectively located adhesion material is located on an end of the probes after they are formed on the temporary substrate and thereafter the probes are transferred to the permanent substrate.

6. The method of claim 1, wherein transfer to the permanent substrate occurs prior to release of the probes from the temporary substrate.

7. The method of claim 6, wherein transfer to the permanent substrate occurs after release of the probes from at least a portion of any sacrificial material that surrounded them during formation.

8. The method of claim 6, wherein transfer to the permanent substrate occurs prior to release of the probes from any sacrificial material that surrounded them during formation.

9. The method of claim 1, wherein transfer to the permanent substrate occurs after release of the probes from the temporary substrate.

10. The method of claim 9, wherein transfer to the permanent substrate occurs prior to release of the probes from any sacrificial material that surrounded them during formation.

11. The method of claim 1, wherein transfer to the permanent substrate occurs after release of the probes from at least a portion of any sacrificial material that surrounded them during formation.

12. The method of claim 1, wherein the transferring of the probes from the temporary substrate to a permanent substrate, comprises:

a. transferring the probes from a temporary substrate to a second temporary substrate, and then

b. transferring the probes from the second temporary substrate to the permanent substrate.

13. The method of claim 1, wherein the formation of the probes on the temporary substrate results in only partial formation of the probes and wherein completion of the formation of the probes occurs while the probes are attached to the permanent substrate.

14. The method of claim 1, wherein prior to transferring the probes to the permanent substrate the probes undergo a heat treatment process capable of enhancing adhesion between layers of a material from which the probes are formed.

15. The method of claim 1, wherein after transferring the probes to the permanent substrate the probes undergo a heat treatment process capable of enhancing adhesion between layers of material from which the probes are formed.

16. The method of claim 1, wherein during transferring of the probes to the permanent substrate the probes are embedded in a conductive sacrificial material which is removed after transfer.

17. The method of claim 1, wherein at least a substantial portion of the probes are fabricated from a plurality of layers of material, where each layer is fabricated on a previously formed layer, and where each layer comprises the deposition of at least one structural material which forms a portion of the probes and at least one sacrificial material that is removed after fabrication of the layers.

18. The method of claim 17 wherein the structural material comprises a metal and the sacrificial material comprises a metal.

19. The method of claim 17 wherein the probes are formed on a substrate that is sacrificial.

20. The method of claim 19 wherein the temporary substrate comprises a release layer and a non-sacrificial substrate portion that is reusable.

21. The method of claim 17 wherein the probes comprise a main body portion and a contact tip portion wherein the contact tip portion comprises a first material and the main body portion comprises a second material that is different from the first material.

22. The method of claim 21 wherein the tip portion is provide with a desired geometry via plating tip material into a mold formed by the mushrooming of a deposited conductive material over a dielectric material.

23. The method of claim 17 wherein the tip portion is formed prior to forming the main body portion and the main body portion is formed from a plurality of layers with a first layer formed on the tip portion and subsequent layers formed on previously formed layers.

24. The method of claim 1 wherein the probes are adhered directly to the permanent substrate via a bonding material.

25. The method of claim 24 wherein the bonding material comprises individual bumps of a solder material.

26. The method of claim 25 wherein the solder is reflowed and solidified prior to bringing it into bonding contact with the permanent substrate.

27. The method of claim 25 wherein the solder material is at least in part surrounded by a solder mask material which aids in inhibiting solder material from bridging between solder bonding regions that are intended to remain electrically isolated.

28. The method of claim 25 wherein individual bumps of the solder material are at least in part held by isolated columns of retention material that results in the solder bumps retaining more of their height upon reflow than would occur in the absence of the retention material.

29. The method of claim 28 wherein retention material inhibits the solder from bridging gaps between individual bumps.

30. The method of claim 1 wherein the probes are compliant.

31. The method of claim 30 wherein the compliance of the probes is primarily provided by the design of the probes in combination with a core material from which the probe is formed.

32. The method of claim 31 wherein a coating material of higher electrical conductive than the core material is made to coat at least a portion of the outer surface of the probes.

33. The method of claim 17 wherein each of the plurality of layers comprises an end-pointing detection pad region onto which material is not deposited.

34. The method of claim 1 wherein a plurality of permanent substrates are attached to a larger substrate.

37. The method of claim 1, wherein the position of the probes relative to the permanent substrate is set at least in part by shims that are formed along with the probes.

38. The method of claim 37 wherein the shims fit into recesses in the surface of the permanent substrate.

39. The method of claim 37 wherein the shims are formed of sacrificial material and are removed upon release of the probes from the sacrificial material.

40. The method of claim 37 wherein the shims are formed of structural material.

41. The method of claim 37 wherein the shims are formed within solder bumps that are used in adhering the probes to the permanent substrate.

42. The method of claim 1, wherein the position of the probes relative to the permanent substrate is set at least in part by shims that are formed on the surface of the permanent substrate.

43. The method of claim 42 wherein the shims are formed of sacrificial material and are removed upon release of the probes from the sacrificial material.

44. The method of claim 1, wherein the position of the probes relative to the permanent substrate is set at least in part by shims that are located between the permanent substrate and selected regions of sacrificial material that bridge gaps between the probes at the time of transfer.

45. The method of claim 1, wherein the probes are held in a desired position relative to the permanent substrate at the time of transfer so as to control, at least in part, the positions of the probes relative to the permanent substrate during transfer.

46. The method of claim 45, wherein the control of position is along at least one axis that is parallel to a plane of the bonding surface of the permanent substrate.

47. The method of claim 45, wherein the control of position is along at an axis that is perpendicular to a plane of the bonding surface of the permanent substrate.

48. The method of claim 1, wherein after transfer, the probes are worked and then ends of the probes that are distal from the permanent substrate are trimmed to establish a desired level of planarity of the array of distal probe ends.

35. The method of claim 35 wherein permanent substrates are attached to the large substrate via a bonding material that is made to flow and then resolidify.

36. The method of claim 35 wherein permanent substrate is attached to the larger substrate via a metallic frame that provides a compliant mounting for each probe die.

49. The method of claim 49, wherein the distal ends of the probes comprise tips for contacting a surface to be probed.

50. The method of claim 49, wherein after trimming the distal ends, contact tips are formed on the distal ends of the probes.

51. The method of claim 49, wherein after trimming the distal ends, contact tips are bonded to the distal ends of the probes.

52. A method for bonding a first electric component to a second electric component, comprising:

forming a plurality of solder bumps on a first electric component, wherein the solder bumps are surrounded, at least in part by rings of a retention material;

bringing the solder bumps on the first component into contact with bonding locations on a second electric component;

heating the solder to cause melting and cooling the solder to bond the first and second components together, wherein the separation between the first and second components is larger than would have been achieved in similar circumstances in the absence of the columns of retention material.

53. The method of claim 52 wherein prior to bring the solder bumps into contact with the pads on the first substrate, reflowing the solder bumps.

54. The method of claim 52 wherein solder bumps have enhanced height to width aspect ratios due to the presence of the rings of retention material.

55. The method of claim 52 wherein retention material resists wetting by the solder and thereby functions as a solder mask material.

56. A method for bonding a first electric component to a second electric component, comprising:

forming a plurality of solder bumps on a first electric component, wherein the solder bumps are surrounded, at least in part by rings of a retention material;

reflowing the solder material such that the height of the reflowed solder is greater than it would be in absence of the retention material;

bringing the solder bumps on the first component into contact with bonding locations on a second electric component; and

heating the solder to cause melting and cooling the solder to bond the first and second components together.