LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

• US 20060109440A1
• Filed: 11/22/2004
• Published: 05/25/2006
• Est. Priority Date: 11/22/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Willem Herman De Jager, Pieter
• Granted Patent: US 7,061,581 B1
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Abstract

A lithographic apparatus including an illumination system for supplying a plurality of beams of radiation, an array of individually controllable elements for imparting to each beam a pattern in its cross section, a substrate table for supporting a substrate, and projection systems for projecting the patterned beams onto the substrate. A displacement system causes relative displacement between the substrate and the projection systems such that the projections beams are scanned across the substrate in a predetermined scanning direction. Each projection system includes an array of lenses arranged such that each lens in the array directs a respective part of the respective beam towards a respective target area on the substrate. The projection systems are arranged in groups such that lenses in the arrays of different groups direct parts of different beams to different target areas of the substrate that are aligned in the scanning direction. The groups of projection systems are spaced apart in the scanning direction and each group directs beams towards target areas of the substrate that are contiguous and occupy a respective contiguous section of the substrate. Thus different sections of the substrate are exposed by different groups of projection systems, enabling high through put with relatively low substrate displacement speeds and relatively small substrate displacements.

Claims

1. A lithographic apparatus comprising:

an illumination system that supplies a plurality of beams of radiation;

an array of individually controllable elements that pattern said plurality of beams of radiation;

a plurality of projection systems that project respective ones of the patterned beams onto a substrate, each of the projection systems comprising an array of lenses arranged so that each lens in the array of lenses directs a part of the respective patterned beams towards a respective target area on the substrate; and

a displacement system that causes relative displacement between the substrate and the projection systems, such that the respective patterned beams are scanned across the substrate in a predetermined scanning direction,

wherein the projection systems are arranged in projection system groups, such that lenses in the array of lenses of different projection system groups direct parts of different ones of the patterned beams to different one of the respective target areas of the substrate that are aligned in the scanning direction,

wherein the projection system groups are spaced apart in the scanning direction, such that each of the projection system groups scans the respective ones of the patterned beams across a respective area of the substrate as the substrate and the projection systems are displaced relative to each other, and

wherein the respective areas being scanned by the respective ones of the patterned beams from respective ones of the projection system groups that are adjacent to each other in the scanning direction are contiguous.

2. The apparatus of claim 1, wherein each of the contiguous areas is generally rectangular.

3. The apparatus of claim 2, comprising:

N of the projection system groups are distributed in the scanning direction with a pitch of L/N, where L is the length of the substrate to be exposed.

4. The apparatus of claim 1, comprising:

two of the projection system groups,

wherein each of the two groups comprises an array of the projection systems, each of the arrays of the projection systems exposing half of a length of the substrate in the scan direction, and

wherein a pitch between the two groups is half of the length of the substrate to be exposed.

5. The apparatus of claim 4, wherein each of the two groups comprises two of the arrays of the projection systems, each of the two arrays exposing the respective target areas of the substrate extending across a width of the substrate.

6. The apparatus of claim 1, comprising:

three of the projection system groups, wherein each of the groups comprises an array of the projection systems that expose one third of a length of the substrate in the scan direction, and the pitch between each of the groups is one third of the length of the substrate to be exposed.

7. The apparatus of claim 1, wherein each of the contiguous areas has a generally rectangular main portion and at least one end portion extending in the scanning direction from the main portion, the at least one end portion of the contiguous areas having a saw-toothed shape with teeth of the at least one end portion overlapping the teeth of the contiguous areas.

8. The apparatus of claim 7, wherein each of the at least one end portions has a length in the scanning direction equal to length in the scanning direction of each of the groups of the projection systems.

9. The apparatus of claim 8, comprising:

N of the groups of the projection systems that are distributed in the scanning direction with a pitch of (L+1)/N, wherein L is a length of the substrate and 1 is a length in the scanning direction of each of the groups of the projection systems.

10. The apparatus of claim 1, wherein:

the displacement system causes displacement of the substrate; and

the projection systems are stationary.

11. The apparatus of claim 1, wherein:

each of the arrays of lenses projects spots the patterned beam that expose tracks on a surface of the substrate; and

the tracks exposed by one of the arrays of lenses are contiguous.

12. A device manufacturing method, comprising:

patterning each of a plurality of beams using arrays of individually controllable elements;

projecting the patterned beams onto a substrate; and

displacing the substrate relative to the patterned beams, such that the patterned beams are scanned across the substrate in a predetermined scanning direction; and

directing the patterned beams towards the substrate using an array of lenses that are arranged such that each lens in the array of lenses directs a respective part of a respective patterned beam towards a respective target area on the substrate,

arranging the projection systems in groups, such that each of the lenses in the arrays of lenses of different ones of the projection system groups direct parts of different ones of the patterned beams to different areas of the substrate that are aligned in the scanning direction; and

spacing the projection system groups apart in the scanning direction, such that each of the projection system groups scans the patterned beams across the areas of the substrate as the substrate and the projection systems are displaced relative to each other, the respective areas scanned by the patterned beams from the projection system groups that are adjacent to each other in the scanning direction are contiguous.

13. The method of claim 12, further comprising making the contiguous areas substantially rectangular.

14. The method of claim 13, further comprising:

distributing N of the projection system groups in the scanning direction with a pitch of L/N, where L is a length of the substrate.

15. The method of claim 12, further comprising:

spacing two of the projection system groups apart in the scanning direction with a pitch of half of a length of the substrate; and

displacing the substrate relative to the projection system groups, such that one half of the substrate is displaced across a full width of one of the projection system groups and the other half of the substrate is displaced across the full width of the other the projection system groups.

16. The method of claim 15, further comprising:

using two arrays of the projection systems in each of the groups, the two arrays of projection systems of each the groups exposing a respective half of the substrate and each of the two arrays of the projection systems exposing alternate pixel areas in the scanning direction of the respective part of the substrate.

17. The method of claim 12, further comprising:

spacing three of the groups of the projection systems apart in the scanning direction with a pitch of one third of a length of the substrate; and

displacing the substrate relative to the groups, such that a respective one third of the substrate is displaced across a full width of each group.

18. The method of claim 12, wherein:

each of the contiguous areas has a generally rectangular main portion and at least one end portion extending in the scanning direction from the main portion, the at least one end portion of each of the contiguous areas having a saw-toothed shape with teeth of one of the at least one end portion overlapping teeth of the contiguous areas.

19. The method of claim 18, wherein each of the at least one end portion has a length in the scanning direction equal to a length in the scanning direction of each of the groups of the projection systems.

20. The method of claim 19, further comprising:

distributing N of the groups of the projection systems in the scanning direction with a pitch of (L+1)/N, wherein L is a length of the substrate and 1 is the length in the scanning direction of each of the groups of the projection systems.

21. The method of claim 12, further comprising:

displacing the substrate; and

making the projection systems stationary.

22. The method of claim 12, further comprising:

projecting spots of the patterned beams using each of the arrays of lenses to expose respective ones of the contiguous tracks on the surface of the substrate.