LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
First Claim
1. A lithographic apparatus comprising:
- an illumination system that supplies a plurality of beams of radiation;
an array of individually controllable elements that pattern said plurality of beams of radiation;
a plurality of projection systems that project respective ones of the patterned beams onto a substrate, each of the projection systems comprising an array of lenses arranged so that each lens in the array of lenses directs a part of the respective patterned beams towards a respective target area on the substrate; and
a displacement system that causes relative displacement between the substrate and the projection systems, such that the respective patterned beams are scanned across the substrate in a predetermined scanning direction, wherein the projection systems are arranged in projection system groups, such that lenses in the array of lenses of different projection system groups direct parts of different ones of the patterned beams to different one of the respective target areas of the substrate that are aligned in the scanning direction, wherein the projection system groups are spaced apart in the scanning direction, such that each of the projection system groups scans the respective ones of the patterned beams across a respective area of the substrate as the substrate and the projection systems are displaced relative to each other, and wherein the respective areas being scanned by the respective ones of the patterned beams from respective ones of the projection system groups that are adjacent to each other in the scanning direction are contiguous.
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Accused Products
Abstract
A lithographic apparatus including an illumination system for supplying a plurality of beams of radiation, an array of individually controllable elements for imparting to each beam a pattern in its cross section, a substrate table for supporting a substrate, and projection systems for projecting the patterned beams onto the substrate. A displacement system causes relative displacement between the substrate and the projection systems such that the projections beams are scanned across the substrate in a predetermined scanning direction. Each projection system includes an array of lenses arranged such that each lens in the array directs a respective part of the respective beam towards a respective target area on the substrate. The projection systems are arranged in groups such that lenses in the arrays of different groups direct parts of different beams to different target areas of the substrate that are aligned in the scanning direction. The groups of projection systems are spaced apart in the scanning direction and each group directs beams towards target areas of the substrate that are contiguous and occupy a respective contiguous section of the substrate. Thus different sections of the substrate are exposed by different groups of projection systems, enabling high through put with relatively low substrate displacement speeds and relatively small substrate displacements.
40 Citations
22 Claims
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1. A lithographic apparatus comprising:
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an illumination system that supplies a plurality of beams of radiation;
an array of individually controllable elements that pattern said plurality of beams of radiation;
a plurality of projection systems that project respective ones of the patterned beams onto a substrate, each of the projection systems comprising an array of lenses arranged so that each lens in the array of lenses directs a part of the respective patterned beams towards a respective target area on the substrate; and
a displacement system that causes relative displacement between the substrate and the projection systems, such that the respective patterned beams are scanned across the substrate in a predetermined scanning direction, wherein the projection systems are arranged in projection system groups, such that lenses in the array of lenses of different projection system groups direct parts of different ones of the patterned beams to different one of the respective target areas of the substrate that are aligned in the scanning direction, wherein the projection system groups are spaced apart in the scanning direction, such that each of the projection system groups scans the respective ones of the patterned beams across a respective area of the substrate as the substrate and the projection systems are displaced relative to each other, and wherein the respective areas being scanned by the respective ones of the patterned beams from respective ones of the projection system groups that are adjacent to each other in the scanning direction are contiguous. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A device manufacturing method, comprising:
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patterning each of a plurality of beams using arrays of individually controllable elements;
projecting the patterned beams onto a substrate; and
displacing the substrate relative to the patterned beams, such that the patterned beams are scanned across the substrate in a predetermined scanning direction; and
directing the patterned beams towards the substrate using an array of lenses that are arranged such that each lens in the array of lenses directs a respective part of a respective patterned beam towards a respective target area on the substrate, arranging the projection systems in groups, such that each of the lenses in the arrays of lenses of different ones of the projection system groups direct parts of different ones of the patterned beams to different areas of the substrate that are aligned in the scanning direction; and
spacing the projection system groups apart in the scanning direction, such that each of the projection system groups scans the patterned beams across the areas of the substrate as the substrate and the projection systems are displaced relative to each other, the respective areas scanned by the patterned beams from the projection system groups that are adjacent to each other in the scanning direction are contiguous. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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Specification