Pattern matching method, program and semiconductor device manufacturing method
First Claim
1. A pattern matching method comprising:
- detecting an edge of a pattern in a pattern image obtained by imaging the pattern;
segmenting the detected pattern edge to generate a first segment set consisting of first segments;
segmenting a pattern edge on reference data which serves as a reference for evaluating the pattern to generate a second segment set consisting of second segments;
combining any of the segments in the first segment set with any of the segments in the second segment set to define a segment pair consisting of first and second segments;
calculating a compatibility coefficient between every two segment pairs in the defined segment pairs;
defining new segment pairs by narrowing down the defined segment pairs by calculating local consistencies of the defined segment pairs on the basis of the calculated compatibility coefficients and by excluding segment pairs having lower local consistencies;
determining an optimum segment pair by repeating the calculating the compatibility coefficient and the defining new segment pairs by narrowing down the segment pairs;
calculating a feature quantity of a shift vector that links the first and second segments making up the optimum segment pair; and
performing position matching between the pattern image and the reference data on the basis of the calculated feature quantity of the shift vector.
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Abstract
A pattern matching method includes: detecting an edge of a pattern in a pattern image obtained by imaging the pattern; segmenting the detected pattern edge to generate a first segment set consisting of first segments; segmenting a pattern edge on reference data which serves as a reference for evaluating the pattern to generate a second segment set consisting of second segments; combining any of the segments in the first segment set with any of the segments in the second segment set to define a segment pair consisting of first and second segments; calculating the compatibility coefficient between every two segment pairs in the defined segment pairs; defining new segment pairs by narrowing down the defined segment pairs by calculating local consistencies of the defined segment pairs on the basis of the calculated compatibility coefficients and by excluding segment pairs having lower local consistencies; determining an optimum segment pair by repeating the calculating the compatibility coefficient and the defining new segment pairs by narrowing down the segment pairs; calculating a feature quantity of a shift vector that links the first and second segments making up the optimum segment pair; and performing position matching between the pattern image and the reference data on the basis of the calculated feature quantity of the shift vector.
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Citations
20 Claims
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1. A pattern matching method comprising:
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detecting an edge of a pattern in a pattern image obtained by imaging the pattern;
segmenting the detected pattern edge to generate a first segment set consisting of first segments;
segmenting a pattern edge on reference data which serves as a reference for evaluating the pattern to generate a second segment set consisting of second segments;
combining any of the segments in the first segment set with any of the segments in the second segment set to define a segment pair consisting of first and second segments;
calculating a compatibility coefficient between every two segment pairs in the defined segment pairs;
defining new segment pairs by narrowing down the defined segment pairs by calculating local consistencies of the defined segment pairs on the basis of the calculated compatibility coefficients and by excluding segment pairs having lower local consistencies;
determining an optimum segment pair by repeating the calculating the compatibility coefficient and the defining new segment pairs by narrowing down the segment pairs;
calculating a feature quantity of a shift vector that links the first and second segments making up the optimum segment pair; and
performing position matching between the pattern image and the reference data on the basis of the calculated feature quantity of the shift vector. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A program which causes a computer to perform a pattern matching method, the pattern matching method comprising:
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detecting an edge of a pattern in a pattern image obtained by imaging the pattern;
segmenting the detected pattern edge to generate a first segment set consisting of first segments;
segmenting a pattern edge on reference data which serves as a reference for evaluating the pattern to generate a second segment set consisting of second segments;
combining any of the segments in the first segment set with any of the segments in the second segment set to define a segment pair consisting of first and second segments;
calculating a compatibility coefficient between every two segment pairs in the defined segment pairs;
defining new segment pairs by narrowing down the defined segment pairs by calculating local consistencies of the defined segment pairs on the basis of the calculated compatibility coefficients and by excluding segment pairs having lower local consistencies;
determining an optimum segment pair by repeating the calculating the compatibility coefficient and the defining new segment pairs by narrowing down the segment pairs;
calculating a feature quantity of a shift vector that links the first and second segments making up the optimum segment pair; and
performing position matching between the pattern image and the reference data on the basis of the calculated feature quantity of the shift vector. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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16. A semiconductor device manufacturing method, comprising a pattern matching method including:
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detecting an edge of a pattern in a pattern image obtained by imaging the pattern;
segmenting the detected pattern edge to generate a first segment set consisting of first segments;
segmenting a pattern edge on reference data which serves as a reference for evaluating the pattern to generate a second segment set consisting of second segments;
combining any of the segments in the first segment set with any of the segments in the second segment set to define a segment pair consisting of first and second segments;
calculating a compatibility coefficient between every two segment pairs in the defined segment pairs;
defining new segment pairs by narrowing down the defined segment pairs by calculating local consistencies of the defined segment pairs on the basis of the calculated compatibility coefficients and by excluding segment pairs having lower local consistencies;
determining an optimum segment pair by repeating the calculating the compatibility coefficient and the defining new segment pairs by narrowing down the segment pairs;
calculating a feature quantity of a shift vector that links the first and second segments making up the optimum segment pair; and
performing position matching between the pattern image and the reference data on the basis of the calculated feature quantity of the shift vector. - View Dependent Claims (17, 18, 19, 20)
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Specification