Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus
First Claim
1. A lithographic apparatus, comprising:
- a radiation system that provides a pulsed beam of radiation;
a patterning device that patterns the beam with a pattern to form a patterned radiation beam;
a projection system having a projection element, the projection system projecting the patterned radiation beam onto a target portion of a substrate on a substrate table; and
an actuator that moves the projection element to shift the patterned radiation beam that is projected onto the substrate during at least one pulse of the radiation system in order to compensate for a positional error between the substrate table and an aerial image of the projection system.
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Accused Products
Abstract
A lithographic apparatus, a device manufacturing method, and a projection element for use in a lithographic apparatus are disclosed. The lithographic apparatus has a radiation system for providing a pulsed beam of radiation, a patterning device for imparting the beam with a pattern to form a patterned radiation beam, and a projection system having a projection element for projecting the patterned beam onto a target portion of a substrate. The apparatus further comprises an actuator for moving the projection element for shifting the patterned beam that is projected onto the substrate during at least one pulse of the radiation system. This can be done to compensate for a positional error between a substrate table holding the substrate and an aerial image of the projection system. The positional error could occur due to mechanical vibrations in the frame system of the lithographic apparatus.
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Citations
25 Claims
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1. A lithographic apparatus, comprising:
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a radiation system that provides a pulsed beam of radiation;
a patterning device that patterns the beam with a pattern to form a patterned radiation beam;
a projection system having a projection element, the projection system projecting the patterned radiation beam onto a target portion of a substrate on a substrate table; and
an actuator that moves the projection element to shift the patterned radiation beam that is projected onto the substrate during at least one pulse of the radiation system in order to compensate for a positional error between the substrate table and an aerial image of the projection system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A device manufacturing method, comprising:
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patterning a beam of radiation using a patterning device;
projecting the patterned beam using a projection element of a projection system onto a target portion of a substrate on a substrate table; and
compensating for a positional error between a substrate table and an aerial image of the projection system through moving of the projection element to shift the patterned beam during at least one pulse of the beam of radiation. - View Dependent Claims (17, 18, 19, 20)
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21. A projection element arranged in a projection system for use in a lithographic apparatus, said lithographic apparatus comprising:
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a radiation system that provides a pulsed beam of radiation; and
a patterning device that patterns the beam with a pattern to form a patterned radiation beam, wherein the projection element is movably arranged in the projection system to shift the patterned beam projected onto the substrate during at least one pulse of the radiation system. - View Dependent Claims (22, 23, 24, 25)
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Specification