Lithographic apparatus and device manufacturing method

• US 20060114446A1
• Filed: 11/30/2004
• Published: 06/01/2006
• Est. Priority Date: 11/30/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Gui, Cheng-Qun
• Granted Patent: US 7,333,177 B2
• Time in Patent Office: Days
• US Class Current: 355/77
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70508 Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Abstract

A lithographic method and apparatus used to pattern an object. An illumination system supplies a beam of radiation. An array of individually controllable elements patterns the beam. The patterned beam is projected by a projection system on to a substrate supported on a substrate table. Individual elements of the array are periodically addressed to load an image frame on to the array appropriate to the pattern to be imparted to the beam at any given instant in time taking into account the image to be projected onto the substrate. In any given frame loading operation, only those individual controllable elements that must change state are addressed to reduce the amount of data required to be transferred during the frame loading operation.

Claims

1. A device manufacturing method, comprising:

patterning a beam of radiation using an array of individually controllable elements;

projecting the patterned beam of radiation onto a target portion of a substrate; and

periodically addressing individual elements of the array of individually controllable elements in an image frame loading operation to set a state of each individually controllable element appropriate to the pattern to be projected, such that only those individually controllable elements that must change state are addressed when a given image frame is loaded.

2. The method according to claim 1, further comprising:

scanning the target portion of the substrate to project an image on to the target portion, the scanning operation being performed by moving at least one of the substrate and the patterned beam of radiation to produce relative movement therebetween in at least a first scan direction.

3. The method according to claim 2, wherein:

the beam comprises pulses of radiation; and

each new image frame is loaded between radiation pulses.

4. The method of claim 2, wherein:

the beam comprises radiation that is continuous during the scanning operation; and

new image frames are loaded as the patterned beam scans across the substrate.

5. The method of claim 2, wherein the image projected on to the substrate at any instant in time comprises an array of image pixels.

6. The method of claim 5, wherein each image pixel corresponds to a respective one of the array of individually controllable elements.

7. The method of claim 5, wherein the array of image pixels corresponds to an array of secondary image sources for which elements of the array of individually controllable elements act as shutters.

8. The method of claim 2, wherein the patterned beam is projected on to the substrate via a micro lens array producing a corresponding array of radiation spots on the substrate.

9. The method of claim 2, wherein the scan direction is selected to minimize the number of individually controllable elements of the array that must change state as any single image frame is loaded as the target portion is scanned.

10. The method of claim 9, wherein the scan direction is selected relative to the image to be projected during the scan operation taking into account image feature boundaries across the array of individually controllable elements that change state as the target portion is scanned.

11. The method of claim 10, wherein the scan direction is selected so that the total length of the image feature boundaries resolved parallel to the scan direction and which are exposed to the patterned beam of radiation at any instant in time is equal to or greater than the total image boundary length resolved orthogonally to the scan direction and which are exposed to the patterned beam of radiation at any instant in time.

12. The method of claim 10, wherein the scan direction is selected so that the total length of the image feature boundaries resolved orthogonally to the scan direction and which are exposed to the patterned beam of radiation at any instant in time is minimized.

13. The method of claim 10, wherein the scan direction is selected so that the total length of the image feature boundaries resolved parallel to the scan direction is equal to or greater than the total length of image boundaries resolved orthogonally to the scan direction.

14. The method of claim 10, wherein the scan direction is selected so that the total length of the image boundaries resolved orthogonally to the scan direction is minimized.

15. The method of claim 2, wherein:

the image to be projected on to the target portion is divided in to at least first and second image portions;

the scanning operation is performed in respective scan stages;

at least a first scan stage projects the first image portion on to the target portion of the substrate; and

at least a second scan stage projects the second image portion on to the target portion of the substrate,

whereby the maximum number of individually controllable elements of the array that must be addressed as any single frame is loaded during each scan stage is less than the maximum number of individually controllable elements of the array that must be addressed as any single frame is loaded if the image as a whole is scanned in a single stage.

16. The method of claim 15, wherein the first image portion is scanned in a first scan direction that minimizes the number of elements of the array of individually controlled elements that must change state as any single frame is loaded during the first scan stage.

17. The method of claim 15, wherein the second image portion is scanned in a second scan direction selected to minimize the number of individually controllable elements of the array that must change state as any single frame is loaded during the second scan stage.

18. The method of claim 15, wherein the second scan direction is oblique to the first scan direction.

19. The method of claim 15, wherein the second scan direction is orthogonal to the first scan direction.

20. The method of claim 15, wherein the second scan direction is parallel to the first scan direction.

21. The method of claim 15, wherein:

the first and second scan directions are selected relative to the first and second image portions, respectively, taking into account image feature boundaries across the array of individually controllable elements that change state as the respective portion of the image is scanned; and

the first scan direction is selected so that (a) the total length of the image feature boundaries resolved in a direction parallel to the first scan direction, which are exposed to the patterned beam of radiation at any instant in time, is equal to or greater than (b) the total image feature boundary length of the first image portion resolved orthogonally to the first scan direction, which is exposed to the patterned beam of radiation at any instant in time.

22. The method of claim 21, wherein:

the second scan direction is selected so that (a) the total length of the image feature boundaries resolved parallel to the second scan direction, which are exposed to the patterned beam of radiation at any instant in time, is equal to or greater than (b) the total image boundary length of the second image portion resolved orthogonally to the second scan direction, which is exposed to the patterned beam of radiation at any instant in time.

23. The method of claim 15, wherein:

the first and second scan directions are selected relative to the first and second image portions, respectively, taking into account image feature boundaries across the array of individually controllable elements that change state as the respective portion of the image is scanned; and

the first scan direction is selected so that the total length of the image feature boundaries resolves in a direction orthogonal to the first scanned direction, which are exposed to the patterned beam of radiation at any instant time, is minimized.

24. The method of claim 23, wherein the second scan direction is selected so that the total length of the image feature boundaries resolved orthogonally to the second scan direction, which are exposed to the patterned beam at any instant in time, is minimized.

25. The method of claim 15, wherein:

the first and second scan directions are selected relative to the first and second image portions, respectively, taking into account image feature boundaries across the array of individually controllable elements that change state as the respective portion of the image is scanned;

the first scan direction is selected so that the total length of the image feature boundaries resolved in a direction parallel to the first scan direction is equal to or greater than the total image feature boundary length of the first image portion resolved orthogonally to the first scan direction; and

the second scan direction is selected so that the total length of the image feature boundaries resolved parallel to the second scan direction is equal to or greater than the total image boundary length of the second image portion resolved orthogonally to the second scan direction.

26. The method of claim 15, wherein:

the first and second scan directions are selected relative to the first and second image portions, respectively, taking into account image feature boundaries across the array of individually controllable elements that change state as the respective portion of the image is scanned;

the first scan direction is selected so that the total length of the image feature boundaries resolved in a direction orthogonal to the first scanned direction is minimized; and

the second scan direction is selected so that the total length of the image feature boundaries resolved orthogonally to the second scan direction is minimized.

27. The method of claim 2, wherein the scan operation is performed to minimize the total number of changes of state of elements of the array of individually controlled elements as the entire target portion is scanned.

28. The method of claim 2, wherein the scan direction is selected to ensure that the number of individually controllable elements of the array that that change state as any single image frame is loaded is below a predetermined maximum.

29. The method of claim 15, further comprising:

dividing the image to be projected; and

selecting respective scan directions to minimize the total number of changes of state of elements of the array of individually controllable elements as the entire target portion is scanned with the complete image.

30. The method of claim 15, further comprising:

dividing the image to be projected; and

selecting respective scan directions so that the maximum number of elements of the array of individually controlled elements that that change state as any single image frame is loaded is below a predetermined maximum.

31. The method of claim 15, further comprising:

dividing the image to be projected; and

selecting respective scan directions to minimize the number of times any particular element of the array of individually controlled elements that change state as the target portion is scanned.

32. The method of claim 2, wherein the scan operation is performed to minimize the number of times any particular element of the array of individually controllable elements that change state as the target portion is scanned.

33. The method of claim 10, wherein the image feature boundaries include hard boundaries defined between areas of the target portion to be exposed and adjacent areas of the target portion that are not be exposed as the target portion is scanned.

34. The method of claim 10, wherein the image feature boundaries include soft boundaries defined between areas of the target portion to be exposed and adjacent areas of the target portion that are not be exposed with different doses of radiation as the target portion is scanned.

35. The method of claim 21, wherein the image feature boundaries include hard boundaries defined between areas of the target portion to be exposed and adjacent areas of the target portion that are not be exposed as the target portion is scanned.

36. The method of claim 21, wherein the image feature boundaries include soft boundaries defined between areas of the target portion to be exposed and adjacent areas of the target portion that are not be exposed with different doses of radiation as the target portion is scanned.

37. The method of claim 1, wherein the patterned beam of radiation is projected on to the entire target portion in a single exposure and each new image frame is loaded on to the array of individually controllable elements between exposures.

38. The method of claim 1, wherein:

at least one of the array of individually controllable elements and the beam is moved to produce relative movement therebetween in a first direction, such that the beam is caused to scan over the array; and

the substrate is moved in a direction parallel to the first direction so that the patterned beam is scanned across the target portion.

39. A lithographic apparatus, comprising:

an illumination system that supplies a beam of radiation;

an array of individually controllable elements that pattern the beam;

a projection system that projects the patterned beam onto a target portion of a substrate; and

means for periodically addressing elements of the array of individually controllable elements in an image frame loading operation to set a state of each individually controllable element appropriate to the pattern to be projected,

wherein only those individually controllable elements that that change state are addressed when a given frame is loaded.

40. The apparatus of claim 39, wherein the means for addressing the array of individually controllable elements comprises a data path and drive electronics for addressing each element of the array in a matrix addressing operation.

41. The apparatus of claim 40, further comprising:

means for moving at least one of the substrate and the patterned beam of radiation to produce relative movement therebetween in at least a first scan direction.

42. The apparatus of claim 41, wherein:

the illumination system provides a beam comprising pulses of radiation; and

the means for addressing the array of individually controllable elements is operated to load each new image frame between radiation pulses.

43. The apparatus of claim 41, wherein:

the illumination system produces a beam that is continuous during a scanning operation; and

the means for addressing the array of individually controllable elements operates to load each new image frame as the patterned beam scans across the target portion of the substrate.

44. The apparatus of claim 41, further comprising:

a microlens array that projects the patterned beam of radiation onto the substrate as an array of radiation spots.

45. The apparatus of claim 41, further comprising:

means for analyzing the image to be projected and determining a scan direction that minimizes the number of individually controllable elements of the array that that change state as any single image frame is loaded during scanning of the target portion.

46. The apparatus of claim 45, wherein the means for analyzing determines the scan direction taking into account image feature boundaries across the array of individually controllable elements that change state as the target portion is scanned.

47. The apparatus of claim 46, wherein the means for analyzing analyzes the image and selects a scan direction so that for (a) the total length of the image feature boundaries resolved parallel to the scan direction, which are exposed to the patterned beam of radiation at any instant in time, is equal to or greater than (b) the total image boundary length resolved orthogonally to the scan direction, which are exposed to the patterned beam of radiation at any instant in time.

48. The apparatus of claim 46, wherein the means for analyzing analyzes the image to determine a scan direction for that the total length of the image feature boundaries resolved orthogonally to the scan direction, which are exposed to the patterned beam of radiation at any instant in time, is minimized.

49. The apparatus of claim 41, wherein:

the means for producing relative movement between the substrate and patterned beam of radiation provides relative movement in a plurality of directions including at least a first scan direction and a second scan direction; and

a first image portion of the image to be projected onto the target portion is scanned in a respective first scan direction; and

a second image portion of the image to be projected onto the target portion is scanned in a respective second scan direction.

50. The apparatus of claim 49, wherein the first scan direction is orthogonal to the second scan direction.

51. A device manufacturing method, comprising:

patterning a beam of radiation using a pattern device comprising an array of individually controllable elements;

projecting the patterned beam of radiation onto a target portion of a substrate;

providing image data to the pattern device to periodically update the pattern to be projected;

periodically addressing individual elements of the array of individually controllable elements in an image frame loading operation to set a state of each individually controllable element appropriate to the pattern to be projected in accordance with the image data,

wherein the image data provided to the pattern device comprises data pertaining only to those individually controllable elements that that change state from one image frame to the next.

52. The device manufacturing method of claim 51, wherein only those individually controllable elements that that change state are addressed each time an image frame is loaded.

53. The device manufacturing method of claim 51, wherein:

the pattern device includes a buffer;

the image data is provided to the buffer;

the image data is stored in the buffer; and

the image data is used to periodically update the array of individually controllable elements,

wherein each individually controllable element of the array is addressed each time an image frame is loaded.

54. The device manufacturing method of claim 53, wherein image data provided to the buffer pertaining to one image frame is added to data previously provided to the buffer pertaining to the preceding image frame, the cumulative data then being used to update the array of individually controllable elements.

55. The device manufacturing method of claim 54, wherein the cumulative data is provided to a driver of the array for addressing each of the individually controllable elements of the array in accordance with the cumulative data.

61. The apparatus of claim 54, further comprising:

a driver that addresses the array of individually controllable elements, the cumulative data being provided to the driver of the array from the buffer.

56. A lithographic apparatus, comprising:

an illumination system that supplies a beam of radiation;

a pattern device comprising an array of individually controllable elements that patterns the beam;

a projection system that projects the patterned beam onto a target portion of a substrate; and

means for providing image data to the pattern device for periodic updating of the pattern to be projected,

wherein the array of individually controllable elements include means for periodically addressing elements of the array in an image frame loading operation to set a state of each individually controllable element appropriate to the pattern to be projected, and

wherein the means for providing image data provides data pertaining only to elements of the array that that change state from one image frame to the next.

57. The apparatus of claim 56, wherein the means for periodically addressing elements of the array addresses only elements of the array that change state each time an image frame is loaded.

58. The apparatus of claim 56, wherein the means for periodically addressing elements of the array addresses each element of the array each time an image frame is loaded.

59. The apparatus of claim 58, wherein the pattern device further comprises a buffer for receiving the image data.

60. The apparatus of claim 59, wherein image data provided to the buffer pertaining to one image frame is added to data previously provided to the buffer pertaining to a preceding image frame and added within the buffer to provide cumulative image data that is then used to update the array of individually controllable elements.

62. A device manufacturing method, comprising:

patterning a beam of radiation using an array of individually controllable elements; and

projecting the patterned beam of radiation onto a target portion of a substrate;

providing image data to the array from a digital image storage device for periodic updating of the pattern to be projected; and

periodically addressing individual elements of the array of individually controllable elements in an image frame loading operation to set a state of each individually controllable element appropriate to the pattern to be projected in accordance with the image data,

wherein the image data relates only to elements of the array that that change state from one image frame to the next.

63. A lithographic apparatus, comprising:

an illumination system that supplies a beam of radiation;

an array of individually controllable elements that pattern the beam;

a projection system that projects the patterned beam onto a target portion of a substrate; and

a data path that provides image data to array from a digital image storage device for periodic updating of the pattern to be projected,

wherein the array of individually controllable elements include means for periodically addressing elements of the array in an image frame loading operation to set a state of each individually controllable element appropriate to the pattern to be projected, and

wherein the image data comprises data relating only to those elements of the array that that change state from one image frame to the next.