System and method for generating pattern data used to control a pattern generator

• US 20060115752A1
• Filed: 11/30/2004
• Published: 06/01/2006
• Est. Priority Date: 11/30/2004
• Status: Active Grant

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: Bleeker, Arno Jan, Chen, Jang Fung, Latypov, Azat M., Troost, Kars Zeger
• Granted Patent: US 7,713,667 B2
• Time in Patent Office: Days
• US Class Current: 430/30
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70441 Optical proximity correction [OPC]
• CPC Class Codes: G03F 7/70508 Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Abstract

A method and system are used to modify pattern data obtained in relation to a pattern on a static patterning device. It is suggested that, in an example when a maskless lithography tool is used, continuous OPC-enhanced features used for maskless lithography rasterization should include a variation in local amplitude and phase transmittance that matches modulation capabilities of a patterning device being used. The modified pattern data is used by a dynamic patterning device to pattern impinging light, which is then projected onto an object. The system and method comprise using a pattern data generating device, a modification device, a dynamic pattern generator, and a projection system. The pattern data generating device generates pattern data corresponding to a pattern on a static patterning device. The modification device receives the pattern data and modifies the pattern data using characteristics of a type of the dynamic pattern generator being used. The dynamic pattern generator receives the modified patterned data and uses the modified pattern data to pattern the beam of radiation. The projection system projects the patterned beam onto the object.

Claims

1. A method, comprising:

(a) receiving a pattern data set;

(b) modifying the pattern data set using parameters corresponding to a type of pattern generator being used to pattern a beam of radiation;

(c) producing a pattern with the pattern generator using the modified pattern data set;

(d) patterning the beam of radiation with the pattern generator having the pattern from step (c); and

(e) projecting the patterned beam onto a target portion of an object.

2. The method of claim 1, further comprising:

performing steps (a)-(e) for each reticle pattern in a set of reticle patterns being used to generate the pattern data set in step (a).

3. The method of claim 1, further comprising:

performing steps (a)-(e) for optical proximity correction patterns in the pattern data set.

4. The method of claim 1, wherein step (a) comprises using an optical rasterization algorithm to generate the received pattern data.

5. The method of claim 1, wherein step (b) comprises using one of tilting reflective devices, pistoning reflective devices, graytoning reflective devices, and light wall devices in the pattern generator.

6. The method of claim 5, wherein step (b) comprises using one of a transmissive or reflective digital mirror device, a grating light valve, a liquid crystal display, and a liquid crystal on silicon (LCOS) device.

7. The method of claim 1, wherein step (b) further comprises:

modifying the pattern data with an optical parameter.

8. The method of claim 7, wherein step (b) further comprises:

using at least one of wavelength, numerical aperture, and illumination mode as the optical parameter.

9. The method of claim 7, wherein the illumination mode comprises:

coherent, partially coherent, or incoherent light.

10. The method of claim 1, further comprising performing steps (a)-(c) in real time during a duration of each pulse of the beam of radiation for each reticle pattern in a set of reticle patterns being used to generate the pattern data set in step (a).

11. The method of claim 1, further comprising performing steps (a)-(c) in real time during a duration between each pulse of the beam of radiation for each reticle pattern in a set of reticle patterns being used to generate the pattern data set in step (a).

12. The method of claim 1, further comprising:

using a substrate as the object.

13. The method of claim 1, further comprising:

using a projection system display device as the object.

14. The method of claim 1, further comprising:

using a projection television system display device as the object.

24. The method of claim 1, wherein step (a) comprises using reticle pattern data as the received pattern data set.

25. The method of claim 1, wherein steps (b), (c), and (d) utilized a dynamic patterning device as the patterning device.

15. A system, comprising:

a pattern data generating device that generates pattern data;

a modification device that receives the pattern data and modifies the pattern data using characteristics of a type of pattern generator used to pattern a beam of radiation;

a pattern generator that receives the modified patterned data and uses the modified pattern data to pattern the beam of radiation; and

a projection system that projects the pattered beam onto an object.

16. The system of claim 15, wherein the modification device modifies the pattern data based on an optical parameter of the system.

17. The system of claim 16, wherein the optical parameter comprises at least one of wavelength, numerical aperture, and illumination mode.

18. The system of claim 17, where the illumination mode is one of coherent, partially coherent, or incoherent light.

19. The system of claim 15, wherein the pattern generator is one of a transmissive or reflective digital mirror device, a grating light valve, a liquid crystal display, and a liquid crystal on silicon (LCOS) device.

20. The system of claim 15, wherein the object is a substrate.

21. The system of claim 15, wherein the object is a projection system display device.

22. The system of claim 15, wherein the object is a projection television system display device.

23. The system of claim 15, wherein the modification device operates in real time and transmits the modified pattern data to the pattern generator just before the pattern generator patterns the beam.

26. The system of claim 15, wherein the generated pattern data corresponds to a reticle pattern.

27. The system of claim 15, wherein the pattern generator is a dynamic pattern generator.