×

System and method using visible and infrared light to align and measure alignment patterns on multiple layers

  • US 20060115956A1
  • Filed: 11/15/2005
  • Published: 06/01/2006
  • Est. Priority Date: 12/01/2004
  • Status: Active Grant
First Claim
Patent Images

1. A system, comprising:

  • an alignment system including an illumination portion and a detector, the illumination portion producing at least visible and infrared light;

    an object, including, a surface layer including a first feature pattern and a first alignment pattern, a support layer, and a second layer, which is located between the surface layer and the support layer, wherein at least one of the support layer and the second layer comprises a second feature pattern and a second alignment pattern; and

    a focusing system that co-focuses on the detector the at least visible and infrared light after each has impinged on at least one of the first and second alignment patterns, whereby the object is aligned to receive subsequent feature patterns based on the detected first and second alignment patterns.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×