×

Lithographic apparatus and device manufacturing method

  • US 20060119815A1
  • Filed: 12/07/2004
  • Published: 06/08/2006
  • Est. Priority Date: 12/07/2004
  • Status: Active Grant
First Claim
Patent Images

1. A lithographic apparatus comprising:

  • an illumination system that conditions a beam of radiation;

    an array of individually controllable elements that patterns the beam;

    a controller that provides pattern control signals to the array of individually controllable elements to impart the pattern; and

    a projection system that projects the patterned beam onto a target portion of a substrate, wherein the controller sends ancillary control signals to at least part of the array of individually controllable elements when no pattern is required to be set on the at least part of the array of individually controllable elements.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×