Calibration substrate and method for calibrating a lithographic apparatus
First Claim
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1. A calibration substrate for use during calibration of a lithographic apparatus, the calibration substrate comprising:
- a first substantially flat surface;
a second substantially flat surface that is substantially parallel to the first surface; and
an edge that connects the first surface to the second surface, wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×
10−
6 K−
1 to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.
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Abstract
A calibration substrate for use during calibration of a lithographic apparatus is disclosed. The calibration substrate includes a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface. The calibration substrate has a thermal expansion coefficient of less than about 1.0×10−6 K−1 to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.
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Citations
45 Claims
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1. A calibration substrate for use during calibration of a lithographic apparatus, the calibration substrate comprising:
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a first substantially flat surface;
a second substantially flat surface that is substantially parallel to the first surface; and
an edge that connects the first surface to the second surface, wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×
10−
6 K−
1 to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. A method for calibrating a lithographic apparatus, the method comprising:
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imaging a marker provided on a patterning device onto a radiation-sensitive layer on a calibration substrate with a beam of radiation;
measuring a property of the image of the marker on the calibration substrate;
determining any error between the measured property and an expected property based on the marker and operating parameters of the apparatus; and
adjusting at least one of the operating parameters of the apparatus to correct for the error, wherein the calibration substrate comprises a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface, and wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×
10−
6 K−
1 to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus. - View Dependent Claims (24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37)
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38. A method for manufacturing a device using a lithographic apparatus, the method comprising:
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calibrating the lithographic apparatus with a calibration substrate, the calibration substrate comprising a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface, wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×
10−
6 K−
1 to reduce deformation thereof due to thermal changes in the calibration substrate while in the lithographic apparatus;
patterning a beam of radiation;
projecting a patterned beam of radiation onto a target area of a radiation sensitive material of a production substrate. - View Dependent Claims (39)
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40. A lithographic apparatus in combination with a calibration substrate for use during calibration of the lithographic apparatus, the lithographic apparatus comprising:
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an illumination system for conditioning a beam of radiation;
a support structure for supporting a patterning device, the patterning device serving to impart the beam of radiation with a pattern in its cross-section;
a substrate table for holding the calibration substrate; and
a projection system for projecting the patterned beam of radiation onto a target portion of the calibration substrate, and the calibration substrate comprising a first substantially flat surface;
a second substantially flat surface that is substantially parallel to the first surface; and
an edge that connects the first surface to the second surface, wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×
10−
6 K−
1 to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus. - View Dependent Claims (41, 42, 43, 44, 45)
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Specification