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MASK, METHOD OF MANUFACTURING MASK, AND LITHOGRAPHIC PROCESS

  • US 20060121360A1
  • Filed: 12/06/2004
  • Published: 06/08/2006
  • Est. Priority Date: 12/06/2004
  • Status: Active Grant
First Claim
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1. A mask of a lithographic process, comprising:

  • a substrate;

    a first polarization layer for allowing a transmission of a first polarization direction of light and avoiding a transmission of a second polarization direction of light;

    a second polarization layer for avoiding a transmission of the first polarization direction of light, wherein the second polarization layer is patterned with a predetermined pattern.

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