System and method for automatically generating a tooling specification using a logical operations utility that can be used to generate a photomask order

• US 20060122724A1
• Filed: 12/07/2004
• Published: 06/08/2006
• Est. Priority Date: 12/07/2004
• Status: Abandoned Application

• Current Assignee: Phototronics Incorporated
• Original Assignee: Photoronics Incorporated
• Inventors: Progler, Christopher J., Croke, Charles E., Cho, Kyu Yeon, You, Chul, Joo, Hyung Jin, Han, Hee Cheol
• Application Number:
  US11/006,525
• Publication Number:
  US 20060122724A1
• Time in Patent Office: Days
• US Class Current: 700/121
• CPC Class Codes: G06Q 10/087 Inventory or stock management, e.g. order filling, procurement or balancing against orders

Abstract

A method of generating a photomask order used to manufacture photomasks using a tooling specification generating system including generating a tooling specification by creating, modifying and/or deleting components of a logical operation that is represented by the tooling specification. Information required for the logical operation may be imported from an external source, such as a database, and/or may be chosen from look-up lists. Aliases for the operators that make up expressions in the logical operation may be modified as desired by the photomask customer. The format of the tooling specification may be verified by the photomask customer'"'"'s computer system. The tooling specification is sent to a computer system of a photomask manufacturer in various proprietary and industry standard formats for analysis of the tooling specification, and the photomask design may be simulated using the tooling specification. After receiving the analysis results, the photomask customer'"'"'s computer system generates the photomask order based on the tooling specification. The photomask order is then sent to the computer system of a photomask manufacturer for manufacture of the photomask. The tooling specification generating system may be a stand-alone system or be integrated with a photomask order generating system.

Claims

1. A method of manufacturing a photomask comprising the steps of:

receiving a tooling specification from a computer system of a photomask customer;

analyzing the tooling specification;

sending results of the analysis to the computer system of the photomask customer;

receiving a photomask order generated based on the tooling specification; and

manufacturing a photomask based on the photomask order.

2. The method of claim 1, wherein the tooling specification is received in at least one of various proprietary and standard photomask data formats.

3. The method of claim 2, wherein the various proprietary and standard photomask data formats comprise at least one of:

GDSII, MEBES, Oasis, DXF, Applican, .cflt, .cinc and .ps.

4. The method of claim 1, wherein the tooling specification is analyzed to determine at least one of validity, feasibility and desirability of the tooling specification.

5. The method of claim 4, wherein the results of the analysis comprise at least one of hot spot and metrology mapping, mask manufacturing rule violations, statistics on feature count and layout density, lithography printing and variability sensitivity analysis, mask cost and cycle time estimate and suggestions for reduction, mask specification consistent with lithography needs, full chip process window and/or CD control estimates and potential for alternate RET scenarios.

6. The method of claim 1, further comprising the step of sending the tooling specification back to the computer system of the photomask customer after analyzing the tooling specification.

7. The method of claim 6, further comprising the step of modifying the tooling specification based on the analysis before sending the tooling specification back to the computer system of the photomask customer.

8. The method of claim 1, further comprising the step of simulating a photomask design using the tooling specification.

9. The method of claim 8, wherein the tooling specification is analyzed using the simulated photomask design.

10. A method of generating a photomask order used to manufacture photomasks comprising the steps of:

generating a tooling specification by creating, modifying and/or deleting components of a logical operation that is represented by the tooling specification;

sending the tooling specification to a computer system of a photomask manufacturer for analysis of the tooling specification;

receiving results of the analysis from the computer system of the photomask manufacturer;

generating a photomask order based on the tooling specification; and

sending the photomask order to the computer system of the photomask manufacturer.

11. The method of claim 10, wherein the components of the logical operation comprise at least one of:

data layer attributes, input data attributes, expressions, pattern groups and aliases.

12. The method of claim 10, further comprising the step of importing data for the components of the logical operation from an external source.

13. The method of claim 12, wherein the step of importing data is done using at least one of a command line generator and a scanner.

14. The method of claim 12, wherein the external source is at least one of:

a database, a GDSII file, a MEBES file and a photomask order template.

15. The method of claim 14, wherein the external source is a database, and the database is shared with the computer system of the photomask manufacturer.

16. The method of claim 10, wherein at least one of the components of the logical operation is chosen from at least one look-up list.

17. The method of claim 11, wherein the components of the logical operation comprise at least one alias, and the method further comprises the step of modifying the at least one alias from its default value.

18. The method of claim 10, further comprising the step of verifying format of the tooling specification.

19. The method of claim 18, wherein the format of the tooling specification is verified using a set of rules.

20. The method of claim 10, further comprising the step of translating the tooling specification into a format that can be used by third party data fracturing applications.

21. The method of claim 10, wherein the tooling specification is generated in at least one of various proprietary and standard photomask data formats.

22. The method of claim 21, wherein the various proprietary and standard photomask data formats comprise at least one of:

GDSII, MEBES, Oasis, DXF, Applican, .cflt, .cinc and .ps.

23. The method of claim 10, further comprising the step of entering data for the components of the logical operation using at least one of a graphics utility interface, a wizard and a command generator.

24. The method of claim 23, wherein the step of entering data is done using a graphics utility interface.

25. The method of claim 23, wherein the step of entering data is done using a wizard.

26. The method of claim 23, wherein the step of entering data is done using a command generator.

27. The method of claim 10, wherein the computer system of the photomask manufacturer analyzes the tooling specification to determine at least one of validity, feasibility and desirability of the tooling specification.

28. The method of claim 27, wherein the results of the analysis comprise at least one of hot spot and metrology mapping, mask manufacturing rule violations, statistics on feature count and layout density, lithography printing and variability sensitivity analysis, mask cost and cycle time estimate and suggestions for reduction, mask specification consistent with lithography needs, full chip process window and/or CD control estimates and potential for alternate RET scenarios.

29. The method of claim 10, further comprising the step of simulating a photomask design using the tooling specification.

30. The method of claim 29, wherein the tooling specification is analyzed using the simulated photomask design.

31. A method of processing a photomask order comprising the steps of:

receiving a tooling specification from a computer system of a photomask customer;

analyzing the tooling specification;

sending results of the analysis to the computer system of the photomask customer; and

receiving a photomask order generated based on the tooling specification.

32. The method of claim 31, wherein the tooling specification is received in at least one of various proprietary and standard photomask data formats.

33. The method of claim 32, wherein the various proprietary and standard photomask data formats comprise at least one of:

GDSII, MEBES, Oasis, DXF, Applican, .cflt, .cinc and .ps.

34. The method of claim 31, wherein the tooling specification is analyzed to determine at least one of validity, feasibility and desirability of the tooling specification.

35. The method of claim 34, wherein the results of the analysis comprise at least one of hot spot and metrology mapping, mask manufacturing rule violations, statistics on feature count and layout density, lithography printing and variability sensitivity analysis, mask cost and cycle time estimate and suggestions for reduction, mask specification consistent with lithography needs, full chip process window and/or CD control estimates and potential for alternate RET scenarios.

36. The method of claim 31, further comprising the step of sending the tooling specification back to the computer system of the photomask customer after analyzing the tooling specification.

37. The method of claim 36, further comprising the step of modifying the tooling specification based on the analysis before sending the tooling specification back to the computer system of the photomask customer.

38. The method of claim 31, further comprising the step of simulating a photomask design using the tooling specification.

39. The method of claim 38, wherein the tooling specification is analyzed using the simulated photomask design.

40. A method of generating a tooling specification using a tooling specification generating system, comprising the steps of:

importing data relating to at least one component of a logical operation from a source external to the specification generating system;

generating a tooling specification based on the at least one component of the logical operation; and

sending the tooling specification to a computer system of a photomask manufacturer for analysis of the tooling specification.

41. The method of claim 40, further comprising the step of generating a photomask order based on the tooling specification.

42. The method of claim 40, wherein the at least one component of the logical operation comprises at least one of:

data layer attributes, input data attributes, expressions, pattern groups and aliases.

43. The method of claim 40, wherein the step of importing is done using at least one of a command line generator and a scanner.

44. The method of claim 40, wherein the external source is at least one of a database, a GDSII file, a MEBES file and a photomask order template.

45. The method of claim 40, wherein the external source is a database, and the database is shared with the computer system of the photomask manufacturer.

46. The method of claim 40, further comprising the step of choosing at least one other component of the logical operation from at least one look-up list.

47. The method of claim 40, further comprising the step of verifying format of the tooling specification.

48. The method of claim 47, wherein the format of the tooling specification is verified using a set of rules.

49. The method of claim 40, further comprising the step of translating the tooling specification into a format that can be used by third party data fracturing applications.

50. The method of claim 40, wherein the tooling specification is generated in at least one of various proprietary and standard photomask data formats.

51. The method of claim 50, wherein the various proprietary and standard photomask data formats comprise GDSII, MEBES, Oasis, DXF, Applican, .cflt, .cinc and .ps.

52. The method of claim 40, further comprising the step of entering data for at least one other component of the logical operation using at least one of a graphics utility interface, a wizard and a command generator.

53. The method of claim 40, wherein the step of entering data for at least one other component is done using a graphics utility interface.

54. The method of claim 40, wherein the step of entering data for at least one other component is done using a wizard.

55. The method of claim 40, wherein the step of entering data for at least one other component is done using a command generator.

56. The method of claim 40, wherein the computer system of the photomask manufacturer analyzes the tooling specification to determine at least one of validity, feasibility and desirability of the tooling specification.

57. The method of claim 56, wherein the results of the analysis comprise at least one of hot spot and metrology mapping, mask manufacturing rule violations, statistics on feature count and layout density, lithography printing and variability sensitivity analysis, mask cost and cycle time estimate and suggestions for reduction, mask specification consistent with lithography needs, full chip process window and/or CD control estimates and potential for alternate RET scenarios.

58. The method of claim 40, further comprising the step of simulating a photomask design using the tooling specification.

59. The method of claim 58, wherein the tooling specification is analyzed using the simulated photomask design.

60. A method of generating a tooling specification used to manufacture photomasks comprising the steps of:

generating a tooling specification by creating, modifying and/or deleting components of a logical operation that is represented by the tooling specification; and

outputting the tooling specification in a format in accordance with a particular standard and/or proprietary photomask order format.

61. The method of claim 60, further comprising the step of verifying format of the tooling specification.

62. The method of claim 61, wherein the format of the tooling specification is verified using a set of rules.

63. The method of claim 61, wherein the various proprietary and standard photomask data formats comprise at least one of:

GDSII, MEBES, Oasis, DXF, Applican, .cflt, .cinc and .ps.

64. A method of generating a photomask order used to manufacture photomasks comprising the steps of:

generating a tooling specification by creating, modifying and/or deleting at least one component of a logical operation using at least one of a graphical user interface, a wizard and a command generator, the logical operation being represented by the tooling specification;

sending the tooling specification to a computer system of a photomask manufacturer for analysis of the tooling specification;

receiving the analysis from the computer system of the photomask manufacturer;

generating a photomask order based on the tooling specification; and

sending the photomask order to the computer system of the photomask manufacturer.

65. The method of claim 64, wherein the components of the logical operation comprise at least one of:

data layer attributes, input data attributes, expressions, pattern groups and aliases.

66. The method of claim 64, further comprising the step of importing data for at least one other component of the logical operation from an external source.

67. The method of claim 66, wherein the step of importing data is done using at least one of a command line generator and a scanner.

68. The method of claim 66, wherein the external source is at least one of:

a database, a GDSII file, a MEBES file and a photomask order template.

69. The method of claim 68, wherein the external source is a database, and the database is shared with the computer system of the photomask manufacturer.

70. The method of claim 66, wherein at least one other component of the logical operation is chosen from at least one look-up list.

71. The method of claim 64, wherein the at least one component of the logical operation comprise at least one alias, and the method further comprises the step of modifying the at least one alias from its default value.

72. The method of claim 64, further comprising the step of verifying format of the tooling specification.

73. The method of claim 72, wherein the format of the tooling specification is verified using a set of rules.

74. The method of claim 64, further comprising the step of translating the tooling specification into a format that can be used by third party data fracturing applications.

75. The method of claim 64, wherein the tooling specification is generated in at least one of various proprietary and standard photomask data formats.

76. The method of claim 75, wherein the various proprietary and standard photomask data formats comprise at least one of:

GDSII, MEBES, Oasis, DXF, Applican, .cflt, .cinc and .ps.

77. The method of claim 64, wherein the step of generating a tooling specification is done using a graphics utility interface.

78. The method of claim 64, wherein the step of generating a tooling specification is done using a wizard.

79. The method of claim 64, wherein the step of generating a tooling specification is done using a command generator.

80. The method of claim 64, wherein the computer system of the photomask manufacturer analyzes the tooling specification to determine at least one of validity, feasibility and desirability of the tooling specification.

81. The method of claim 80, wherein the results of the analysis comprise at least one of hot spot and metrology mapping, mask manufacturing rule violations, statistics on feature count and layout density, lithography printing and variability sensitivity analysis, mask cost and cycle time estimate and suggestions for reduction, mask specification consistent with lithography needs, full chip process window and/or CD control estimates and potential for alternate RET scenarios.

82. The method of claim 64, further comprising the step of simulating a photomask design using the tooling specification.

83. The method of claim 82, wherein the tooling specification is analyzed using the simulated photomask design.

84. A photomask order generating system used to manufacture photomasks comprising:

a tooling specification generator for creating, modifying and/or deleting components of a logical operation that is represented by a tooling specification;

a tooling specification analyzer that analyzes the tooling specification; and

a photomask order generator that generates a photomask order based on the tooling specification and transmits the photomask order to a computer system of a photomask manufacturer.

85. The system of claim 84, wherein the tooling specification analyzer comprises a file transmitter that transmits the tooling specification to a computer system of a photomask manufacturer for analysis of the tooling specification.

86. The system of claim 84, wherein the components of the logical operation comprise at least one of:

data layer attributes, input data attributes, expressions, pattern groups and aliases.

87. The system of claim 84, further comprising a data importer that imports data for at least one of the components of the logical operation from an external source.

88. The system of claim 87, wherein the data importer comprises at least one of a command line generator and a scanner.

89. The system of claim 87, wherein the external source is at least one of:

a database, a GDSII file, a MEBES file and a photomask order template.

90. The system of claim 89, wherein the external source is a database, and the database is shared with the computer system of the photomask manufacturer.

91. The system of claim 84, further comprising at least one look-up list from which at least one of the components of the logical operation is chosen.

92. The system of claim 86, wherein the components of the logical operation comprise at least one alias, and the system further comprises an alias manager for modifying the at least one alias from its default value.

93. The system of claim 84, further comprising a logical operation verifier for verifying format of the logical operation.

94. The system of claim 93, wherein the logical operation verifier uses a set of rules to verify the format of the logical operation.

95. The system claim 84, further comprising a tooling specification translator for translating the tooling specification into a format that can be used by third party data fracturing applications.

96. The system of claim 84, wherein the tooling specification generator generates the tooling specification in at least one of various proprietary and standard photomask data formats.

97. The system of claim 96, wherein the various proprietary and standard photomask data formats comprise at least one of:

GDSII, MEBES, Oasis, DXF, Applican, .cflt, .cinc and .ps.

98. The system of claim 84, further comprising at least one of a graphics utility interface, a wizard and a command generator for entering data for the components of the logical operation.

99. The system of claim 84, further comprising a graphics utility interface for entering data for the components of the logical operation.

100. The system of claim 84, further comprising a wizard for entering data for the components of the logical operation.

101. The system of claim 84, further comprising a command generator for entering the components of the logical operation.

102. The system of claim 84, wherein the tooling specification analyzer analyzes the tooling specification to determine at least one of validity, feasibility and desirability of the tooling specification.

103. The system of claim 102, wherein the tooling specification analyzer produces analysis results regarding at least one of hot spot and metrology mapping, mask manufacturing rule violations, statistics on feature count and layout density, lithography printing and variability sensitivity analysis, mask cost and cycle time estimate and suggestions for reduction, mask specification consistent with lithography needs, full chip process window and/or CD control estimates and potential for alternate RET scenarios.

104. The system of claim 84, further comprising a photomask design simulator for simulating a photomask design using the tooling specification.

105. The system of claim 104, wherein the tooling specification analyzer analyzes the tooling specification using the photomask design simulated by the photomask design simulator.

106. A photomask order generating system used to manufacture photomasks comprising:

a tooling specification generator for creating, modifying and/or deleting components of a logical operation that is represented by the tooling specification, the tooling specification including fracturing instructions for a photomask design;

a photomask design simulator that simulates the photomask design using the fracturing instructions; and

a photomask order generator that generates a photomask order based on the tooling specification and that transmits the photomask order to a computer system of a photomask manufacturer.

107. The system of claim 106, further comprising a tooling specification analyzer for analyzing the tooling specification.

108. The system of claim 107, wherein the tooling specification analyzer transmits the tooling specification to a computer system of a photomask manufacturer for analysis of the tooling specification.

109. The system of claim 106, wherein the components of the logical operation comprise at least one of:

data layer attributes, input data attributes, expressions, pattern groups and aliases.

110. The system of claim 106, further comprising a data importer that imports data for at least one of the components of the logical operation from an external source.

111. The system of claim 110, wherein the data importer comprises at least one of a command line generator and a scanner.

112. The system of claim 110, wherein the external source is at least one of:

a database, a GDSII file, a MEBES file and a photomask order template.

113. The system of claim 110, wherein the external source is a database, and the database is shared with the computer system of the photomask manufacturer.

114. The system of claim 106, further comprising at least one look-up list from which at least one of the components of the logical operation is chosen.

115. The system of claim 109, wherein the components of the logical operation comprise at least one alias, and the system further comprises an alias manager for modifying the at least one alias from its default value.

116. The system of claim 106, further comprising a logical operation verifier for verifying format of the logical operation.

117. The system of claim 116, wherein the logical operation verifier uses a set of rules to verify the format of the logical operation.

118. The system of claim 106, further comprising a tooling specification translator for translating the tooling specification into a format that can be used by third party data fracturing applications.

119. The system of claim 106, wherein the tooling specification generator generates the tooling specification in at least one of various proprietary and standard photomask data formats.

120. The system of claim 119, wherein the various proprietary and standard photomask data formats comprise at least one of:

GDSII, MEBES, Oasis, DXF, Applican, .cflt, .cinc and .ps.

121. The system of claim 106, further comprising at least one of a graphics utility interface, a wizard and a command generator for entering data for the components of the logical operation.

122. The system of claim 106, further comprising a graphics utility interface for entering data for the components of the logical operation.

123. The system of claim 106, further comprising a wizard for entering data for the components of the logical operation.

124. The system of claim 106, further comprising a command generator for entering the components of the logical operation.

125. The system of claim 106, wherein the tooling specification analyzer analyzes the tooling specification to determine at least one of validity, feasibility and desirability of the tooling specification.

126. The system of claim 125, wherein the tooling specification analyzer produces analysis results regarding at least one of hot spot and metrology mapping, mask manufacturing rule violations, statistics on feature count and layout density, lithography printing and variability sensitivity analysis, mask cost and cycle time estimate and suggestions for reduction, mask specification consistent with lithography needs, full chip process window and/or CD control estimates and potential for alternate RET scenarios.

127. The system of claim 107, wherein the tooling specification analyzer analyzes the tooling specification using the photomask design simulated by the photomask design simulator.

128. A method for generating a photomask order used to manufacture photomasks comprising the steps of:

generating a tooling specification by creating, modifying and/or deleting components of a logical operation that is represented by the tooling specification, the tooling specification including fracturing instructions for a photomask design;

simulating the photomask design using the fracturing instructions;

analyzing the tooling specification based on the simulated photomask design;

generating a photomask order based on the tooling specification; and

transmitting the photomask order to a computer system of a photomask manufacturer.

129. The method of claim 128, wherein the components of the logical operation comprise at least one of:

data layer attributes, input data attributes, expressions, pattern groups and aliases.

130. The method of claim 128, further comprising the step of importing data for the components of the logical operation from an external source.

131. The method of claim 130, wherein the step of importing data is done using at least one of a command line generator and a scanner.

132. The method of claim 130, wherein the external source is at least one of:

a database, a GDSII file, a MEBES file and a photomask order template.

133. The method of claim 132, wherein the external source is a database, and the database is shared with the computer system of the photomask manufacturer.

134. The method of claim 128, wherein at least one of the components of the logical operation is chosen from at least one look-up list.

135. The method of claim 129, wherein the components of the logical operation comprise at least one alias, and the method further comprises the step of modifying the at least one alias from its default value.

136. The method of claim 128, further comprising the step of verifying format of the tooling specification.

137. The method of claim 136, wherein the format of the tooling specification is verified using a set of rules.

138. The method of claim 128, further comprising the step of translating the tooling specification into a format that can be used by third party data fracturing applications.

139. The method of claim 128, wherein the tooling specification is generated in at least one of various proprietary and standard photomask data formats.

140. The method of claim 139, wherein the various proprietary and standard photomask data formats comprise at least one of:

GDSII, MEBES, Oasis, DXF, Applican, .cflt, .cinc and .ps.

141. The method of claim 128, further comprising the step of entering data for the components of the logical operation using at least one of a graphics utility interface, a wizard and a command generator.

142. The method of claim 141, wherein the step of entering data is done using a graphics utility interface.

143. The method of claim 141, wherein the step of entering data is done using a wizard.

144. The method of claim 141, wherein the step of entering data is done using a command generator.

145. The method of claim 128, wherein the tooling specification is analyzed to determine at least one of validity, feasibility and desirability of the tooling specification.

146. The method of claim 145, wherein results of the analysis comprise at least one of hot spot and metrology mapping, mask manufacturing rule violations, statistics on feature count and layout density, lithography printing and variability sensitivity analysis, mask cost and cycle time estimate and suggestions for reduction, mask specification consistent with lithography needs, full chip process window and/or CD control estimates and potential for alternate RET scenarios.

147. A method of generating a photomask order used to manufacture photomasks comprising the steps of:

generating a tooling specification by creating, modifying and/or deleting components of a logical operation that is represented by the tooling specification;

verifying that the tooling specification is in a proper format;

sending the tooling specification to a computer system of a photomask manufacturer for analysis of the tooling specification;

receiving the analysis from the computer system of the photomask manufacturer;

generating a photomask order based on the tooling specification; and

sending the photomask order to the computer system of the photomask manufacturer.

148. The method of claim 147, wherein the components of the logical operation comprise at least one of:

data layer attributes, input data attributes, expressions, pattern groups and aliases.

149. The method of claim 147, further comprising the step of importing data for the components of the logical operation from an external source.

150. The method of claim 149, wherein the step of importing data is done using at least one of a command line generator and a scanner.

151. The method of claim 149, wherein the external source is at least one of:

a database, a GDSII file, a MEBES file and a photomask order template.

152. The method of claim 151, wherein the external source is a database, and the database is shared with the computer system of the photomask manufacturer.

153. The method of claim 147, wherein at least one of the components of the logical operation is chosen from at least one look-up list.

154. The method of claim 147, wherein the components of the logical operation comprise at least one alias, and the method further comprises the step of modifying the at least one alias from its default value.

155. The method of claim 147, wherein the format of the tooling specification is verified using a set of rules.

156. The method of claim 147, further comprising the step of translating the tooling specification into a format that can be used by third party data fracturing applications.

157. The method of claim 147, wherein the tooling specification is generated in at least one of various proprietary and standard photomask data formats.

158. The method of claim 157, wherein the various proprietary and standard photomask data formats comprise at least one of:

GDSII, MEBES, Oasis, DXF, Applican, .cflt, .cinc and .ps.

159. The method of claim 147, further comprising the step of entering data for the components of the logical operation using at least one of a graphics utility interface, a wizard and a command generator.

160. The method of claim 159, wherein the step of entering data is done using a graphics utility interface.

161. The method of claim 159, wherein the step of entering data is done using a wizard.

162. The method of claim 159, wherein the step of entering data is done using a command generator.

163. The method of claim 147, wherein the computer system of the photomask manufacturer analyzes the tooling specification to determine at least one of validity, feasibility and desirability of the tooling specification.

164. The method of claim 163, wherein the results of the analysis comprise at least one of hot spot and metrology mapping, mask manufacturing rule violations, statistics on feature count and layout density, lithography printing and variability sensitivity analysis, mask cost and cycle time estimate and suggestions for reduction, mask specification consistent with lithography needs, full chip process window and/or CD control estimates and potential for alternate RET scenarios.

165. The method of claim 147, further comprising the step of simulating a photomask design using the tooling specification.

166. The method of claim 165, wherein the tooling specification is analyzed using the simulated photomask design.

167. A method of generating a tooling specification used to manufacture photomasks comprising the steps of:

at least one of creating, modifying and deleting components of a logical operation, the components comprising at least one expression having an operator and at least one alias corresponding to the operator;

modifying the at least one alias from a default value; and

generating a tooling specification based on the logical operation comprising the modified at least one alias.

168. The method of claim 167, further comprising sending the tooling specification to a computer system of the photomask manufacturer for analysis of the tooling specification.

169. The method of claim 167, further comprising the step of verifying format of the tooling specification.

170. The method of claim 167, further comprising the step of simulating a photomask design based on the tooling specification.

171. The method of claim 167, further comprising the step of importing data for at least one of the components of the logical operation from an external source.

172. The method of claim 171, wherein the step of importing data is done using at least one of a command line generator and a scanner.

173. The method of claim 171, wherein the external source is at least one of:

a database, a GDSII file, a MEBES file and a photomask order template.

174. The method of claim 173, wherein the external source is a database, and the database is shared with a computer system of a photomask manufacturer.

175. The method of claim 167, wherein at least one of the components of the logical operation is chosen from at least one look-up list.

176. A tooling specification generating system used to manufacture photomasks comprising:

a logical operations manager for at least one of creating, modifying and deleting components of a logical operation, the components comprising at least one expression having an operator and at least one alias corresponding to the operator;

an alias manager for modifying the at least one alias from a default value; and

a tooling specification generator that generates a tooling specification based on the logical operation comprising the modified at least one alias.

177. The system of claim 176, further comprising a tooling specification analyzer that sends the tooling specification to a computer system of a photomask manufacturer for analysis of the tooling specification.

178. The system of claim 176, further comprising a tooling specification verifier for verifying format of the tooling specification.

179. The system of claim 176, further comprising a photomask design simulator that simulates a photomask design based on the tooling specification.

180. The system of claim 176, further comprising a data importer for importing data for at least one of the components of the logical operation from an external source.

181. The system of claim 180, wherein the data importer comprises at least one of a command line generator and a scanner.

182. The system of claim 180, wherein the external source is at least one of:

a database, a GDSII file, a MEBES file and a photomask order template.

183. The system of claim 182, wherein the external source is a database, and the database is shared with a computer system of a photomask manufacturer.

184. The system of claim 176, further comprising at least one look-up list from which at least one of the components of the logical operation is chosen.

185. A computer readable medium containing computer readable instructions for a computer to perform a method comprising the steps of:

generating a tooling specification by creating, modifying and/or deleting components of a logical operation that is represented by the tooling specification;

sending the tooling specification to a computer system of a photomask manufacturer for analysis of the tooling specification;

receiving the tooling specification from the computer system of the photomask manufacturer;

generating a photomask order based on the tooling specification; and

sending the photomask order to the computer system of the photomask manufacturer.

186. A tooling specification generating system comprising:

a data importer for importing data relating to at least one component of a logical operation from a source external to the tooling specification generating system;

a tooling specification generator for generating a tooling specification based on the at least one component of the logical operation; and

a tooling specification analyzer comprising a file transmitter that transmits the tooling specification to a computer system of a photomask manufacturer for analysis of the tooling specification.

187. The system of claim 186, wherein the data importer comprises at least one of a command line generator and a scanner.

188. The system of claim 186, wherein the external source is at least one of:

a database, a GDSII file, a MEBES file and a photomask order template.

189. The system of claim 188, wherein the external source is a database, and the database is shared with the computer system of the photomask manufacturer.

190. A photomask order generating system comprising:

a tooling specification generator for creating, modifying and/or deleting at least one component of a logical operation using at least one of a graphical user interface, a wizard and a command generator, the logical operation being represented by the tooling specification;

a tooling specification analyzer that sends the tooling specification to a computer system of a photomask manufacturer for analysis of the tooling specification; and

a photomask order generator that generates a photomask order based on the tooling specification and that sends the photomask order to the computer system of the photomask manufacturer.

191. The system of claim 190, wherein the tooling specification generator comprises a graphics utility interface.

192. The system of claim 190, wherein the tooling specification generator comprises a wizard.

193. The system of claim 190, wherein the tooling specification generator comprises a command generator.

194. A photomask order generating system comprising:

a tooling specification generator for creating, modifying and/or deleting components of a logical operation that is represented by the tooling specification;

a logical operation verifier for verifying that the logical operation is in a proper format;

a tooling specification analyzer that sends the tooling specification to a computer system of a photomask manufacturer for analysis of the tooling specification; and

a photomask order generator that generates a photomask order based on the tooling specification and that sends the photomask order to the computer system of the photomask manufacturer.

195. The system of claim 194, wherein the logical operation verifier uses a set of rules to verify the format of the logical operation.