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Substrate processing device

  • US 20060124058A1
  • Filed: 11/06/2003
  • Published: 06/15/2006
  • Est. Priority Date: 11/11/2002
  • Status: Abandoned Application
First Claim
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1. A substrate processing apparatus, comprising:

  • a reaction container which accommodates a substrate, to which a plurality of reaction gases are supplied, and which forms a space where said substrate is subjected to desired processing, an exhaust port which is opened in said reaction container for exhausting gas from said reaction container, and a gas supply system for supplying at least the plurality of reaction gases to said reaction container, wherein said gas supply system comprises;

    a cleaning gas supply unit for supplying cleaning gas which removes accretion adhering to an inner side of said reaction container by subjecting said substrate to the desired processing, a post-processing gas supply unit for supplying post-processing gas which can remove an element included in the cleaning gas remaining in said reaction container after the accretion is removed by supplying the cleaning gas, and said post-processing gas includes all reaction gases used when said substrate is subjected to the desired processing.

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