Vertical double-diffused metal oxide semiconductor (VDMOS) device incorporating reverse diode
First Claim
1. A Vertical Double-Diffused Metal Oxide Semiconductor (VDMOS) device comprising:
- a drain region of a first conductivity type formed on an epitaxial layer of the first conductivity type, a plurality of double diffusion source regions isolated from the drain region formed on the epitaxial layer, and a gate electrode overlapped on an upper portion of a part of the source region; and
wherein one source region in close proximity to the drain region is a first diffusion structure in which a heavily doped diffusion layer of a second conductivity type is formed in a body region of the second conductivity type, wherein other source regions are a second diffusion structure in which a heavily doped diffusion layer of the first conductivity type and a heavily doped diffusion layer of the second conductivity type are formed in a body region of the second conductivity type.
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Abstract
The present invention disclosed herein is a Vertical Double-Diffused Metal Oxide Semiconductor (VDMOS) device incorporating a reverse diode. This device includes a plurality of source regions isolated from a drain region. A source region in close proximity to the drain region is a first diffusion structure in which a heavily doped diffusion layer of a second conductivity type is formed in a body region of a second conductivity type. Another source region is a second diffusion structure in which a heavily doped diffusion layer of a first conductivity type and a heavily doped diffusion layer of the second conductivity type are formed in the body region of the second conductivity type. An impurity diffusion structure of the source region in close proximity to the drain region is changed to be operated as a diode, thereby forming a strong current path to ESD (Electro-Static Discharge) or EOS (Electrical Over Stress). As a result, it is possible to prevent the device from being broken down.
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Citations
17 Claims
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1. A Vertical Double-Diffused Metal Oxide Semiconductor (VDMOS) device comprising:
- a drain region of a first conductivity type formed on an epitaxial layer of the first conductivity type, a plurality of double diffusion source regions isolated from the drain region formed on the epitaxial layer, and a gate electrode overlapped on an upper portion of a part of the source region; and
wherein one source region in close proximity to the drain region is a first diffusion structure in which a heavily doped diffusion layer of a second conductivity type is formed in a body region of the second conductivity type, wherein other source regions are a second diffusion structure in which a heavily doped diffusion layer of the first conductivity type and a heavily doped diffusion layer of the second conductivity type are formed in a body region of the second conductivity type. - View Dependent Claims (2, 3, 4, 5, 6)
- a drain region of a first conductivity type formed on an epitaxial layer of the first conductivity type, a plurality of double diffusion source regions isolated from the drain region formed on the epitaxial layer, and a gate electrode overlapped on an upper portion of a part of the source region; and
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7. A Vertical Double-Diffused Metal Oxide Semiconductor (VDMOS) device comprising:
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an epitaxial layer of a first conductivity type formed on a substrate;
a buried diffusion layer of the first conductivity type formed at a boundary portion of the epitaxial layer and the substrate;
a drain region of the first conductivity type formed in an upper part of the epitaxial layer; and
a plurality of source regions isolated from the drain region to be formed in the upper part of the epitaxial layer, wherein the source regions comprises;
a first source region comprising a first body region of a second conductivity type and a first heavily doped diffusion layer of the second conductivity type formed in the first body region; and
a second source region comprising a second body region, a first heavily doped diffusion layer of the first conductivity type formed in the second body region, and a second heavily doped diffusion layer of the second conductivity type, wherein the source region in close proximity to the drain region is the first source region. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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Specification