Writing of photo-induced structures

• US 20060125913A1
• Filed: 06/27/2003
• Published: 06/15/2006
• Est. Priority Date: 06/28/2002
• Status: Abandoned Application

• Current Assignee: Australian Photonics Pty. Ltd., Sydney The University of Business Liaison Office
• Original Assignee: Australian Photonics Pty. Ltd., Sydney The University of Business Liaison Office
• Inventors: Sceats, Mark, Stepanov, Dmitri Yu
• Application Number:
  US10/519,903
• Publication Number:
  US 20060125913A1
• Time in Patent Office: Days
• US Class Current: 347/248
• CPC Class Codes: B82Y 20/00 Nanooptics, e.g. quantum optics or photonic crystals
• CPC Class Codes: G02B 6/1225 comprising photonic band-gap structures or photonic lattices
• CPC Class Codes: G02B 6/124 Geodesic lenses or integrated gratings
• CPC Class Codes: G02B 6/13 Integrated optical circuits characterised by the manufacturing method
• CPC Class Codes: G03F 7/70408 Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
• CPC Class Codes: G11B 7/00 Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor G11B11/00, G11B13/00 take precedence

Abstract

A method of writing a photo-induced structure into a photosensitive material substrate, the method comprising the steps of creating an interference pattern utilising at least two light beams, exposing the substrate to the interference pattern for photo-inducing material changes in the substrate, and creating an irregularity in the interference pattern by controlling a wavefront of at least one of the beams, for creating a functional defect in the photo-induced structure.

Claims

1. A method of writing a photo-induced structure into a photosensitive material substrate, the method comprising:

creating an interference pattern utilising at least two light beams,

exposing the substrate to the interference pattern for photo-inducing material changes in the substrate, and

creating an irregularity in the interference pattern by controlling a wavefront of at least one of the beams, for creating a functional defect in the photo-induced structure.