×

Lithographic apparatus and device manufacturing method

  • US 20060126047A1
  • Filed: 12/09/2004
  • Published: 06/15/2006
  • Est. Priority Date: 12/09/2004
  • Status: Active Grant
First Claim
Patent Images

1. A lithographic apparatus, comprising:

  • an illumination system that supplies a beam of radiation;

    an array of individually controllable elements that pattern the beam; and

    a projection system that projects the patterned beam onto a target portion of a substrate, wherein the array of individually controllable elements includes a substrate having a plurality of supports on which the individually controllable elements are mounted, and wherein the individually controllable elements each comprise, a planar reflector, having a reflective surface substantially located in a reflecting plane, and at least two hinges having an elongated portion, wherein the hinges are each connected at one end to the planar reflector and at the other end to one of the supports on the substrate.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×