Purged vacuum chuck with proximity pins
First Claim
1. A substrate support structure, the structure comprising:
- a substrate support comprising a first surface and a second surface opposite the first surface;
a plurality of proximity pins projecting to a first height above the first surface, the first height being less than 100 μ
m;
a plurality of purge ports passing from the second surface to the first surface; and
a plurality of vacuum ports passing from the second surface to the first surface.
2 Assignments
0 Petitions
Accused Products
Abstract
A substrate support structure comprising a first surface and a second surface opposite the first surface. The substrate support structure also comprises a plurality of proximity pins projecting to a first height above the first surface, the first height being less than 100 μm. In addition, the substrate support structure further comprises a plurality of purge ports passing from the second surface to the first surface and a plurality of vacuum ports passing from the second surface to the first surface. In one embodiment, the plurality of purge ports are arranged in a first circular pattern, the first circular pattern having a first radial dimension less than the radius of the substrate support, and the plurality of vacuum ports are arranged in a second circular pattern, the second circular pattern having a second radial dimension less than the first radial dimension.
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Citations
19 Claims
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1. A substrate support structure, the structure comprising:
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a substrate support comprising a first surface and a second surface opposite the first surface;
a plurality of proximity pins projecting to a first height above the first surface, the first height being less than 100 μ
m;
a plurality of purge ports passing from the second surface to the first surface; and
a plurality of vacuum ports passing from the second surface to the first surface. - View Dependent Claims (2, 3, 4, 5)
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6. A method of manufacturing a substrate support structure, the method comprising:
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providing a substrate support, the substrate support comprising a first surface and a second surface opposite the first surface;
forming a plurality of recessed regions in the first surface;
providing a plurality of seed crystals having at least one planar surface;
placing the plurality of seed crystals in the plurality of recessed regions so that the at least one planar face is substantially coplanar with the first surface; and
selectively depositing a plurality of proximity pins in contact with the plurality of seed crystals and extending to a first height above the first surface. - View Dependent Claims (7, 8, 9, 10)
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11. A method of manufacturing a substrate support structure, the method comprising:
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providing a substrate support, the substrate support comprising a first surface and a second surface opposite the first surface;
forming a plurality of recessed regions in the first surface, the plurality of recessed regions characterized by a first depth;
providing a plurality of support structures characterized by a dimension greater than the first depth;
inserting the plurality of support structures into the plurality of recessed regions;
pressing the plurality of support structures into the plurality of recessed regions to align a surface of the plurality of support structures with the first surface, thereby deforming the plurality of recessed regions;
removing a portion of the substrate support defined by a depth measured from the first surface to a third surface to expose to expose a portion of the support structures. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19)
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Specification