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Lithographic apparatus, device manufacturing method, and device manufactured thereby

  • US 20060132735A1
  • Filed: 12/22/2004
  • Published: 06/22/2006
  • Est. Priority Date: 12/22/2004
  • Status: Active Grant
First Claim
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1. A substrate processing apparatus comprising:

  • a lithographic apparatus, the lithographic apparatus including;

    an illumination system for supplying a projection beam of radiation;

    an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section to form a patterned beam; and

    a projection system for projecting the patterned beam onto a target portion of a substrate;

    a substrate supply arranged to output at least one unbroken length of substrate; and

    a substrate conveying system arranged to convey each outputted unbroken length of substrate from the substrate supply and past the projection system such that the projection system is able to project the patterned beam onto a series of target portions along each unbroken length of substrate.

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