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Lithographic apparatus and device manufacturing method utilizing hexagonal image grids

  • US 20060132746A1
  • Filed: 12/22/2004
  • Published: 06/22/2006
  • Est. Priority Date: 12/22/2004
  • Status: Active Grant
First Claim
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1. A system, comprising:

  • a source of radiation that produces a beam of radiation;

    a patterning device that patterns the beam; and

    a projection system that projects the patterned beam onto a target portions of a substrate, the projection system including a microlens array positioned proximate the substrate and configured to form a substantially hexagonal grid pattern on the substrate.

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