Lithographic apparatus and device manufacturing method
First Claim
1. A lithographic apparatus, comprising:
- an illumination system that supplies a beam of radiation;
a patterning arrangement that patterns the beam;
a projection system that projects the beam onto a target portion of a substrate;
an error compensator that supplies error correction values to compensate for an effect of errors in the projection system; and
a grey scale modulator that supplies drive signals to the patterning arrangement based on the error correction values in order to compensate for the effect of errors in the projection system by varying an intensity of some parts of the pattern beam.
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Accused Products
Abstract
A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.
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Citations
18 Claims
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1. A lithographic apparatus, comprising:
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an illumination system that supplies a beam of radiation;
a patterning arrangement that patterns the beam;
a projection system that projects the beam onto a target portion of a substrate;
an error compensator that supplies error correction values to compensate for an effect of errors in the projection system; and
a grey scale modulator that supplies drive signals to the patterning arrangement based on the error correction values in order to compensate for the effect of errors in the projection system by varying an intensity of some parts of the pattern beam. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A device manufacturing method, comprising:
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patterning a beam of radiation using an adjustable patterning arrangement;
projecting the patterned beam of radiation onto a target portion of the substrate using a projection system;
detecting errors in the projection system;
providing error correction values that are used to compensate for an effect of errors in the projection system; and
supplying drive signals to the patterning arrangement based on the error correction values in order to compensate for the effect of errors in the projection system by varying an intensity of some parts of the patterned beam. - View Dependent Claims (13, 14, 15, 16, 17, 18)
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Specification