Ultrasonic distance sensors
First Claim
1. An ultrasonic distance sensor for monitoring the height of a substrate surface sensor, the sensor comprising:
- an ultrasonic emitter system that emits a first transmitted beam towards the substrate surface and a second transmitted beam;
an ultrasonic receiver system that receives a first reflected beam produced by reflection of the first transmitted beam from the substrate surface and a second reflected beam produced by reflection of the second transmitted beam; and
a signal processor that processes signals received from the ultrasonic emitter system and ultrasonic receiver system indicative of time differences between the emission and receipt of the transmitted and reflected beams in order to monitor the height of the substrate surface.
1 Assignment
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Accused Products
Abstract
A lithographic apparatus comprises an illumination system, a support constructed to support a patterning device, and a projection system. In pixel grid imaging, a large number of small optical spots are imaged onto the substrate surface using a micro-lens array (MLA). The z position of the MLA is adjustable in order to focus the spots on the substrate surface and/or to compensate for differences in height of the substrate surface. The focusing adjustment is based on an output of an ultrasonic distance sensor provided in the vicinity of the substrate surface.
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Citations
23 Claims
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1. An ultrasonic distance sensor for monitoring the height of a substrate surface sensor, the sensor comprising:
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an ultrasonic emitter system that emits a first transmitted beam towards the substrate surface and a second transmitted beam;
an ultrasonic receiver system that receives a first reflected beam produced by reflection of the first transmitted beam from the substrate surface and a second reflected beam produced by reflection of the second transmitted beam; and
a signal processor that processes signals received from the ultrasonic emitter system and ultrasonic receiver system indicative of time differences between the emission and receipt of the transmitted and reflected beams in order to monitor the height of the substrate surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A lithographic apparatus comprising:
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an illumination system that conditions a radiation beam;
a support that supports a patterning device, the patterning device pattering the beam;
a projection system that projects the patterned beam onto a target portion of a substrate; and
an ultrasonic distance sensor that monitors a height of a surface of the substrate, the sensor comprising, an ultrasonic emitter system that emits a first transmitted beam towards the substrate surface and a second transmitted beam, an ultrasonic receiver system that receives a first reflected beam produced by reflection of the first transmitted beam from the substrate surface and a second reflected beam produced by reflection of the second transmitted beam, and a signal processor that processes signals received from the ultrasonic emitter system and the ultrasonic receiver system indicative of time differences between the emission and the receipt of the transmitted and reflected beams in order to monitor the height of the substrate surface.
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13. A method of monitoring a height of a substrate surface, comprising:
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emitting a first ultrasonic transmitted beam towards the substrate surface;
emitting a second ultrasonic transmitted beam;
receiving a first reflected beam produced by reflection of the first transmitted beam from the substrate surface;
receiving a second reflected beam produced by reflection of the second transmitted beam; and
processing signals indicative of time differences between the emission and the receipt of the transmitted and reflected beams in order to monitor the height of the substrate surface. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. A device manufacturing method comprising transferring an image of a pattern from a patterning device onto a surface of a substrate, while adjusting focusing of the image of the pattern in dependence on variation in a height of the surface of the substrate, wherein the height of the substrate surface is monitored by:
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emitting a first ultrasonic transmitted beam towards the substrate surface;
emitting a second ultrasonic transmitted beam;
receiving a first reflected beam produced by reflection of the first transmitted beam from the substrate surface;
receiving a second reflected beam produced by reflection of the second transmitted beam; and
processing signals indicative of the time differences between the emission and receipt of the transmitted and reflected beams in order to monitor the height of the substrate surface.
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Specification