Substrates coated with a polycrystalline functional coating

• US 20060134322A1
• Filed: 12/20/2004
• Published: 06/22/2006
• Est. Priority Date: 12/20/2004
• Status: Active Grant

• Current Assignee: PPG Industries Ohio Incorporated (Nouryon BV)
• Original Assignee: PPG Industries Ohio Incorporated (Nouryon BV)
• Inventors: Walck, Scott D., Harris, Caroline S.
• Granted Patent: US 7,498,058 B2
• Time in Patent Office: Days
• US Class Current: 427/161
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 2217/71 Photocatalytic coatings
• CPC Class Codes: C23C 14/024 Deposition of sublayers, e.g. to promote adhesion of the coating C23C14/027 takes precedence
• CPC Class Codes: C23C 14/083 of refractory metals or yttrium
• CPC Class Codes: C23C 16/0272 Deposition of sub-layers, e.g. to promote the adhesion of the main coating
• CPC Class Codes: C23C 16/405 of refractory metals or yttrium

Abstract

A method for forming a coated substrate is disclosed. The method includes depositing an undercoating layer on a substrate; and depositing a functional coating on the undercoating layer, the functional coating comprising at least one material that can be present in at least two crystal structures, wherein the at least two crystal structures are present at and exposed surface of the functional coating, wherein the undercoating layer comprises at least two different materials wherein a first material at the exposed surface provides a first surface area and a second different material at the exposed surface provides a second surface area.

Claims

1. A method for forming a coated substrate comprising:

a. depositing an undercoating layer on a substrate; and

b. depositing a functional coating on the undercoating layer, the functional coating comprising at least one material that can be present in at least two crystal structures, wherein the at least two crystal structures are present at and exposed surface of the functional coating,

wherein the undercoating layer comprises at least two different materials wherein a first material at the exposed surface provides a first surface area and a second different material at the exposed surface provides a second surface area.

2. The method of claim 1, wherein depositing the undercoating layer is accomplished using CVD, spray pyrolysis, MSVD, PECVD, or PACVD.

3. The method of claim 1, wherein, the deposited undercoating layer has a thickness of at least 10 nm.

area that can nucleate a second crystal structure of the at least one material.

4. The method of claim 1, wherein the first material comprises an oxide of tin and the second material comprises an oxide of silicon.

5. The method of claim 1, wherein the first material and the second material are in a gradient coating layer.

6. The method of claim 1, wherein the undercoating layer comprises a doped material.

7. The method of claim 1, wherein depositing the functional coating is accomplished by CVD, spray pyrolysis, MSVD, PECVD, or PACVD.

8. The method of claim 1, wherein the deposited functional coating has a thickness ranging from 100 Å

to 2500 Å

.

9. The method of claim 1, wherein the functional coating is a photocatalytic coating.

10. The method of claim 9, wherein the photocatalytic coating comprises at least one metal oxide selected from titanium oxides, iron oxides, tungsten oxides, zinc oxides, tin oxides, zinc/tin oxides, calcium titanium oxides, molybdenum oxides, niobium oxides, and mixtures thereof.

11. The method of claim 1, wherein the substrate is glass.

12. The method of claim 11, wherein the method is carried out on a float glass line during a glass making operation.

13. A method for forming a coated substrate comprising:

a. depositing an undercoating layer over the substrate comprising at least two different materials wherein a first material at the exposed surface provides the first surface area and a second different material at the exposed surface provides the second surface area; and

b. depositing a photocatalytic coating over the undercoating layer comprising TiO₂, wherein TiO₂ having the anatase crystal structure and TiO₂ having the rutile crystal structure are present at an exposed surface of the TiO₂ coating.

14. The method of claim 13, wherein, the deposited undercoating layer has a thickness of at least 10 nm.

15. The method of claim 13, wherein depositing the photocatalytic coating is accomplished by CVD, spray pyrolysis, MSVD, PECVD, or PACVD.

17. A coated substrate comprising:

a. a substrate;

b. an undercoating layer over the substrate comprising at least two different materials wherein a first material at the exposed surface provides the first surface area and a second different material at the exposed surface provides the second surface area; and

c. a functional coating over the undercoating, wherein the at least two crystal structures of the at least one material of the functional coating are present at an exposed surface of the functional coating.

16. The method of claim 17, wherein the deposited photocatalytic coating has a thickness ranging from 100 Å

to 2500 Å

.

18. The coated substrate of claim 17, wherein the undercoating is selected from a doped material or at least two different materials.

19. The coated substrate of claim 17, wherein the at least one material of the functional coating is a photocatalytic coating comprising TiO₂ and further wherein an anatase crystal structure of the TiO₂ and a rutile crystal structure of the TiO₂ are both present at the exposed surface of the photocatalytic coating.

20. The coated substrate of claim 19, wherein the undercoating comprises oxides of tin and oxides of silicon.