Dense coating formation by reactive deposition

• US 20060134347A1
• Filed: 12/20/2004
• Published: 06/22/2006
• Est. Priority Date: 12/20/2004
• Status: Active Grant

• Current Assignee: Nanogram Corporation (Teijin Limited)
• Original Assignee: Nanogram Corporation (Teijin Limited)
• Inventors: Chiruvolu, Shivkumar, Chapin, Michael Edward
• Granted Patent: US 7,491,431 B2
• Time in Patent Office: Days
• US Class Current: 427/585
• CPC Class Codes: B05D 3/06 by exposure to radiation B05D3/02 takes precedence ; plasma treatment B05D3/141
• CPC Class Codes: C23C 16/45519 Inert gas curtains
• CPC Class Codes: C23C 16/483 using coherent light, UV to IR, e.g. lasers
• CPC Class Codes: C23C 26/00 Coating not provided for in groups C23C2/00 - C23C24/00
• CPC Class Codes: C23C 8/00 Solid state diffusion of only non-metal elements into metallic material surfaces diffusion of silicon C23C10/00; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals C23C14/00 takes precedence
• CPC Class Codes: H01M 2008/1293 Fuel cells with solid oxide electrolytes
• CPC Class Codes: H01M 2008/147 Fuel cells with molten carbonates
• CPC Class Codes: H01M 8/0228 in the form of layered or coated products
• CPC Class Codes: H01M 8/0252 tubular
• CPC Class Codes: H01M 8/1231 with both reactants being gaseous or vaporised
• CPC Class Codes: H01M 8/141 the anode and the cathode being gas-permeable electrodes or electrode layers
• CPC Class Codes: Y02E 60/50 Fuel cells

Abstract

Methods for forming coated substrates can be based on depositing material from a flow onto a substrate in which the coating material is formed by a reaction within the flow. In some embodiments, the product materials are formed in a reaction driven by photon energy absorbed from a radiation beam. In additional or alternative embodiments, the flow with the product stream is directed at the substrate. The substrate may be moved relative to the flow. Coating materials can be formed with densities of 65 percent to 95 percent of the fully densified coating material with a very high level of coating uniformity.

Claims

1. A method for coating a substrate, the method comprising:

reacting a flowing reactant stream by directing a radiation beam at the reactant stream to produce a product stream downstream from the radiation beam, wherein the reaction is driven by photon energy from the radiation beam; and

directing the product stream at a substrate selectively positioned in the flow to coat the substrate with a coating material from the product stream at a density of at least about 65 percent of the density of the fully densified coating material.

2. The method of claim 1 wherein the flowing reactant stream comprises exclusively vapor reactants.

3. The method of claim 1 wherein the flowing reactant stream comprises aerosol reactants.

4. The method of claim 1 wherein the reactant stream comprises a compound with a plurality of metal/metalloid species.

5. The method of claim 1 wherein the reactant stream is confined within shielding gas.

6. The method of claim 1 wherein while directing the product stream at the substrate, the substrate is moved relative to the flow of the product stream.

7. The method of claim 6 wherein the substrate is mounted on a conveyor and is moved relative to a reaction chamber.

8. The method of claim 6 wherein the reactant nozzle and corresponding optics are mounted on a drive and wherein the product flow is swept relative to the substrate by moving the reactant nozzle and optics.

9. The method of claim 1 wherein the density of the coating material is at least about 75 percent of the density of the fully densified coating material.

10. The method of claim 1 wherein the density of the coating material is at least about 90 percent of the density of the fully densified coating material.

11. The method of claim 1 wherein the density of the coating material is approximately the density of the fully densified coating material.

12. The method of claim 1 wherein the substrate has a non-planar surface onto which the coating is applied.

13. The method of claim 1 wherein the coating material is non-porous.

14. The method of claim 1 wherein the coating material is amorphous.

15. The method of claim 1 wherein the coating material is crystalline.

16. The method of claim 1 wherein the coating material is single crystalline.

17. The method of claim 1 wherein the substrate is non-porous.

18. A method for coating a substrate, the method comprising:

depositing a non-porous coating by directing flow of a product stream to a suitably positioned substrate to deposit the coating on the substrate, wherein the product stream is formed by reacting a reactant stream within the flow to form the product stream, the reaction being driven with photon energy absorbed from a radiation beam.

19. A method for coating a substrate, the method comprising:

depositing a coating material to form a coating having a density of at least about 65 percent of the density of the fully densified coating material, wherein the coating is deposited from a product composition in a reactor, wherein product composition is within a product stream is formed by reacting a reactant stream in which the reaction is driven with photon energy absorbed from a radiation beam, and wherein the depositing of the coating comprises moving the product stream relative to the substrate.

20. The method of claim 19 wherein the depositing of the coating material comprises directing the product stream at the substrate that is suitably positioned.

21. The method of claim 19 wherein the depositing of the coating material comprises moving the substrate relative to the flow of the product stream.

22. The method of claim 21 wherein the substrate is mounted on a conveyor and is moved relative to a reaction chamber.

23. The method of claim 21 wherein the reactant nozzle and corresponding optics are mounted on a mount and wherein the product flow is swept relative to the substrate by moving the reactant nozzle and optics.