Plasma generating apparatus, plasma generating method and remote plasma processing apparatus

• US 20060137613A1
• Filed: 02/13/2004
• Published: 06/29/2006
• Est. Priority Date: 01/27/2004
• Status: Abandoned Application

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Kasai, Shigeru
• Application Number:
  US10/545,399
• Publication Number:
  US 20060137613A1
• Time in Patent Office: Days
• US Class Current: 118/723.MW
• CPC Class Codes: H01J 37/32192 Microwave generated discharge H01J37/32357, H01J37/32366, H01J37/32394, H01J37/32403 take precedence
• CPC Class Codes: H01J 37/3222 Antennas

Abstract

A compact plasma generating apparatus providing high efficiency of plasma excitation is presented. A plasma generating apparatus (100) comprises a microwave generating apparatus (10) for generating microwaves, a coaxial waveguide (20) having a coaxial structure comprising an inner tube (20a) and an outer tube (20b), a monopole antenna (21) being attached to one end of said inner tube (20a), for directing the microwaves generated by said microwave generating apparatus (10) to the monopole antenna (21), a resonator (22) composed of dielectric material for holding the monopole antenna (21), and a chamber (23) in which a specific process gas is fed for plasma excitation. The chamber (23) has an open surface and the resonator (22) is placed on this open surface, and the process gas is excited by the microwaves radiated from the monopole antenna (21) through the resonator (22) into the interior of the chamber (23) to generate plasma.

Claims

1. A plasma generating apparatus comprising:

a microwave generating apparatus for generating microwaves with a predetermined wavelength;

a coaxial waveguide having a coaxial structure comprising an inner tube and an outer tube, an antenna being attached to one end of said inner tube, for directing the microwaves generated by said microwave generating apparatus to said antenna;

a resonator composed of dielectric material for holding said antenna; and

a chamber in which a specific process gas is fed for plasma excitation, said chamber having an open surface, said resonator being placed on said open surface,

wherein said process gas is excited by the microwaves radiated from said antenna through said resonator into the interior of said chamber.

2. A plasma generating apparatus according to claim 1, wherein said antenna is a monopole antenna.

3. A plasma generating apparatus according to claim 2, wherein, when λ

a is a wavelength of the microwaves generated by said microwave generating apparatus, ε

r is a relative dielectric constant of said resonator, and λ

g is a wavelength of the microwaves inside said resonator obtained by dividing said wavelength λ

a by the square root of said relative dielectric constant ε

r (λ

g=λ

a/ε

r^1/2), said monopole antenna has a length of 23%-26% of said wavelength λ

g, and said resonator has a thickness of 50%-70% of said wavelength λ

g.

4. A plasma generating apparatus according to claim 1, wherein said antenna is a helical antenna.

5. A plasma generating apparatus according to claim 4, wherein, when λ

a is a wavelength of the microwaves generated by said microwave generating apparatus, ε

r is a relative dielectric constant of said resonator, and λ

g is a wavelength of the microwaves inside said resonator obtained by dividing said wavelength λ

a by the square root of said relative dielectric constant ε

r (λ

g=λ

a/ε

r^1/2), a thickness of said resonator, between the end of said helical antenna and a surface of said resonator on the side of said chamber is 25%-45% of said wavelength λ

g.

6. A plasma generating apparatus according to claim 1, wherein said antenna is a slot antenna.

7. A plasma generating apparatus according to claim 6, wherein, when λ

a is a wavelength of the microwaves generated by said microwave generating apparatus, ε

r is a relative dielectric constant of said resonator, and λ

g is a wavelength of the microwaves inside said resonator obtained by dividing said wavelength λ

a by the square root of said relative dielectric constant ε

r (λ

g=λ

a/ε

r^1/2), said resonator has a thickness of 25%-45% of said wavelength λ

g.

8. A plasma generating apparatus according to claim 1, wherein said microwave generating apparatus has a microwave power source, an amplifier for regulating output power of the microwaves which are output from said microwave power source, and an isolator for absorbing reflected microwaves which are returning to said amplifier after being output from said amplifier.

9. A plasma generating apparatus according to claim 1, comprising a plurality of said coaxial waveguide and said antenna, wherein said microwave generating apparatus has a microwave power source, a distributor for distributing the microwaves generated by said microwave power source to each of said coaxial waveguide and said antenna, a plurality of amplifiers for regulating output power of microwaves respectively which are output from said distributor, and a plurality of isolators for absorbing reflected microwaves which are returning to said plurality of amplifiers after being output from said plurality of amplifiers.

10. A plasma generating apparatus according to claim 9, further comprising a plasma control device for controlling said microwave generating apparatus, wherein microwaves are radiated from one or some of said plurality of antennas through said resonator into the interior of said chamber to excite said process gas and, after the plasma generation, microwaves are radiated from all of said plurality of antennas through said resonator into the interior of said chamber.

11. A plasma generating apparatus according to claim 1, wherein said resonator is composed of either quartz-type material, single-crystal-alumina-type material, polycrystalline-alumina-type material or aluminum-nitride-type material.

12. A plasma generating apparatus according to claim 1, wherein a corrosion protection member composed of quartz-type material, single-crystal-alumina-type material or polycrystalline-alumina-type material is applied on the inner surface of said chamber to prevent corrosion of said chamber.

13. A plasma generating apparatus according to claim 1, wherein said chamber has a jacket structure with cooling ability by flowing a coolant in the interior of the members constituting said chamber.

14. A plasma generating apparatus according to claim 1, wherein said chamber is a base-enclosed cylindrical member and has said open surface at one end, said base-enclosed cylindrical member having an exhaust vent in the bottom wall to discharge the gas excited by microwaves outwardly from said chamber and a gas discharge opening in the proximity of the open surface side of the side wall to discharge said process gas to the interior space.

15. A plasma generating apparatus according to claim 1, wherein a slug tuner that is slidable in a longitudinal direction of said coaxial waveguide is attached to said coaxial waveguide to perform impedance matching for said antenna.

16. A plasma generating method in a plasma generating apparatus comprising a plurality of antennas for radiating microwaves of a predetermined output level to a chamber in which a process gas is fed for plasma excitation, the method comprising the steps of:

generating plasma by radiating microwaves from one or some of said plurality of antennas into the interior of said chamber to excite said process gas; and

stabilizing the plasma by radiating microwaves from all of said plurality of antennas into the interior of said chamber after the plasma generation.

17. A remote plasma processing apparatus comprising:

a plasma generating apparatus for exciting a specific process gas by microwaves; and

a substrate processing chamber for accommodating a substrate and providing specific processing to said substrate by the excited gas generated by exciting said process gas in said plasma generating apparatus,

said plasma generating apparatus comprising;

a microwave generating apparatus for generating microwaves with a predetermined wavelength;

a coaxial waveguide having a coaxial structure comprising an inner tube and an outer tube, an antenna being attached to one end of said inner tube, for directing the microwaves generated by said microwave generating apparatus to said antenna;

a resonator composed of dielectric material for holding said antenna; and

a chamber in which a specific process gas is fed to be excited by the microwaves radiated from said antenna through said resonator for plasma excitation.