Gallium nitride based light-emitting device
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Accused Products
Abstract
A manufacturing method and a thus produced light-emitting structure for a white colored light-emitting device (LED) and the LED itself are disclosed. The white colored LED includes a resonant cavity structure, producing and mixing lights which may mix into a white colored light in the resonant cavity structure, so that the white colored LED may be more accurately controlled in its generated white colored light, which efficiently reduces deficiency, generates natural white colored light and aids in luminous efficiency promotion. In addition to the resonant cavity structure, the light-emitting structure also includes a contact layer, an n-type metal electrode and a p-type metal electrode.
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Citations
24 Claims
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1-3. -3. (canceled)
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4. A light-emitting structure for a light emitting diode (LED), comprising a resonant cavity structure, a contact layer, an n-type metal electrode and a p-type metal electrode, wherein:
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said resonant cavity structure formed by a metal reflector, a substrate, a buffer layer, an n-GaN based layer, an MQW active layer and a p-type distributed Bragg reflector (DBR), wherein and said substrate comprises sapphire;
said contact layer being a p-GaN based layer and formed over said p-type DBR;
said n-type metal electrode disposed over an exposing layer of said n-GaN layer; and
said p-type metal electrode disposed over said p-GaN layer;
wherein said MQW active layer comprises a material so that said MQW active layer generates a light with a wavelength comprising 380-600 nm in response to an applied electric power between said n-type metal electrode and said p-type metal electrode. - View Dependent Claims (5, 6, 7, 8)
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9. A light-emitting structure for a light-emitting device (LED), comprising:
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a metal reflector on a bottom side of a substrate, wherein said metal reflector has a thickness of 50 to 10 μ
m and is made of a conductive metal or metal alloy;
an LT-GaN/HT-GaN buffer layer having a first formed LT-GaN buffer layer on said substrate and a then formed HT-GaN buffer layer on said LT-GaN buffer layer, wherein said LT-GaN buffer layer has a thickness of 30 to 500 while said HT-GaN buffer layer with a thickness of 0.5 to 6 μ
m;
an n-GaN semiconductor layer having a thickness of 2 to 6 μ
m;
an InGaN/GaN MQW active layer;
a p-AlGaN/GaN distributed Bragg reflector (DBR); and
a p+-GaN based semiconductor layer having a thickness of 0.2 to 0.5 μ
m;
wherein said substrate comprising sapphire and said MQW active layer emits a light with a wavelength comprising 380-600 nm in response to an applied electric power;
- View Dependent Claims (10, 11, 12)
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13-15. -15. (canceled)
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16. A light-emitting structure for a light emitting diode (LED), comprising a substrate, a resonant cavity structure, a contact layer, an n-type metal electrode and a p-type metal electrode, wherein:
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said substrate comprising sapphire and having a buffer layer thereon;
said resonant cavity structure formed over said buffer layer, comprising an n-type distributed Bragg reflector (DBR), an n-GaN based layer, a multi-quantum well (MQW) active layer and a p-type DBR layers;
said contact layer being a p-GaN based layer and formed over said p-type DBR;
said n-type metal electrode disposed over an exposing region of said n-GaN layer; and
said p-type metal electrode disposed over said p-GaN based layer;
wherein said MQW active layer comprises a material so that said MQW active layer generates a light with a wavelength of 380 nm to 600 nm in response to an applied electric power between said p-type electrode and said n-type electrode. - View Dependent Claims (17, 18, 19, 20)
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21. A light-emitting structure for a light-emitting device (LED) comprised of an epitaxial structure, comprising:
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an LT-GaN/HT-GaN buffer layer having a first formed LT-GaN buffer layer on a substrate and a then formed HT-GaN buffer layer on said LT-GaN buffer layer, wherein said LT-GaN buffer layer has a thickness of 30 to 500 while said HT-GaN buffer layer has a thickness of 0.5 to 6 μ
m;
an n-AlGaN/GaN distributed Bragg reflector (DBR);
an n-GaN semiconductor layer having a thickness of 2 to 6 μ
m;
an InGaN/GaN MQW active layer;
a p-AlGaN/GaN DBR; and
a p+-GaN based semiconductor layer having a thickness of 0.2 to 0.5 μ
m;
wherein said substrate comprises sapphire and said MQW active layer emits a light with a wavelength comprising 380-600 nm in response to an applied electric power. - View Dependent Claims (22, 23, 24)
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Specification