Lithographic apparatus and device manufacturing method utilizing a multiple substrate carrier for flat panel display substrates
First Claim
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1. A lithographic apparatus, comprising:
- an illumination system, wherein the illumination system is arranged to generate a beam of radiation;
a patterning system, wherein the patterning system is arranged to pattern the beam;
a substrate table, wherein the substrate table is arranged to simultaneously hold a plurality of substrates;
a projection system, wherein the projection system is arranged to project the patterned beam onto a target portion of a corresponding one of the plurality of substrates; and
a substrate handler, wherein the substrate handler is arranged to move each of the plurality substrates relative to the substrate table and is arranged to singly or simultaneously carry the plurality of substrates.
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Abstract
A system and method allow for more than one substrate to be simultaneously moved and/or positioned on a support table. In one example, this is accomplished through use of a frame that either supports or separates one or more substrates for either transport or positioning on a support table. In another example, this is accomplished through use of spacers on a support table, which are used to properly position one or more substrates. In yet another example, this is accomplished through use of a robot placing one or more substrates on the support table.
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Citations
23 Claims
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1. A lithographic apparatus, comprising:
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an illumination system, wherein the illumination system is arranged to generate a beam of radiation;
a patterning system, wherein the patterning system is arranged to pattern the beam;
a substrate table, wherein the substrate table is arranged to simultaneously hold a plurality of substrates;
a projection system, wherein the projection system is arranged to project the patterned beam onto a target portion of a corresponding one of the plurality of substrates; and
a substrate handler, wherein the substrate handler is arranged to move each of the plurality substrates relative to the substrate table and is arranged to singly or simultaneously carry the plurality of substrates. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method, comprising:
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patterning a beam of radiation;
projecting the patterned beam onto a target portion of each of a plurality of substrates simultaneously supported on a same support table; and
singly or simultaneously moving each of the plurality of substrates between a handling device and the support table. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23)
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Specification