Methods and systems for lithographic beam generation

• US 20060139609A1
• Filed: 12/29/2004
• Published: 06/29/2006
• Est. Priority Date: 12/29/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Baselmans, Johannes Jacobus Matheus, Vink, Henri Johannes Petrus, De Jager, Pieter Willem Herman, Bruinsma, Anastasius Jacobus Anicetus, Munnig Schmidt, Robert-Han
• Granted Patent: US 7,342,644 B2
• Time in Patent Office: Days
• US Class Current: 355/69
• CPC Class Codes: G03F 7/7005 by multiple sources, e.g. light-emitting diodes [LED] or light source arrays addressable array sources specially adapted to produce patterns without a mask G03F7/70391

Abstract

A lithographic illumination apparatus and method includes receiving a plurality of source radiation beams from a plurality of corresponding radiation sources, deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation, imparting the projection beam of radiation with a cross-section pattern, and projecting the patterned projection beam of radiation onto a target portion of a substrate.

Claims

1. A lithographic apparatus, comprising:

an illumination system that supplyies a projection beam of radiation;

an array of individually controllable elements serving that imparts the projection beam with a pattern in its cross-section;

a substrate table that holds a substrate; and

a projection system that projects the patterned beam onto a target portion of the substrate;

wherein the illumination system includes a beam delivery system having at least one radiation beam deflecting element and at least one radiation input that receives a plurality of source radiation beams from respective radiation sources, said at least one radiation beam deflecting element being arranged to deflect each of the received source radiation beams along a single common beam path, to provide said projection beam of radiation.

2. The apparatus according to claim 1, wherein each of said source radiation beams is a pulsed radiation beam including a periodic series of radiation pulses, wherein the projection beam includes a series of discrete radiation pulses, and wherein each radiation pulse in the projection beam is formed of a respective single pulse from a respective single source radiation beam.

3. The apparatus according to claim 2, wherein each of the source radiation beams is of substantially the same wavelength of radiation, and each of the periodic series of radiation pulses has substantially the same repetition frequency.

4. The apparatus according to claim 1, wherein the projection beam includes a periodic series of groups of radiation pulses, and wherein each group of pulses is separated by a time period sufficient to allow a change in configuration of at least one of said controllable elements.

5. The apparatus according to claim 4, wherein the beam delivery system further comprises a group intensity controller arranged to control the intensity of at least one pulse within each group, to ensure the radiation intensity of each group is within predetermined limits.

6. The apparatus according to claim 5, wherein the group intensity controller is arranged to selectively inhibit the provision of said at least one pulse to said group of pulses.

7. The apparatus according to claim 5, wherein the group intensity controller is arranged to controllably attenuate the intensity of said at least one pulse.

8. The apparatus according to claim 5, wherein the at least one pulse comprises the last pulse in each group, and the group intensity controller is arranged to control said intensity in dependence upon the measured intensity of the other pulses within said group.

9. The apparatus according to claim 5, wherein the at least one pulse comprises the last pulse in each group, and the group intensity controller is arranged to control said intensity in dependence upon the measured intensity of each of the pulses within said group.

10. The apparatus according to claim 1, wherein said at least one radiation beam deflecting element comprises a controllable radiation beam deflecting element, each of the received source radiation beams being incident upon said controllable radiation beam deflecting element, which acts to deflect each received source radiation beam along the single common beam path.

11. The apparatus according to claim 1, wherein each of said source radiation beams is polarized, and said at least one radiation beam deflecting element comprises at least one polarized beam splitter.

12. The apparatus according to claim 11, wherein said beam delivery system further comprises a controllable polarization changing element arranged to change the polarization state of incident radiation.

13. The apparatus according to claim 1, further comprising said respective radiation sources that provides the plurality of source radiation beams.

14. A method of projecting a pattern onto a substrate, comprising:

receiving a plurality of source radiation beams from a plurality of corresponding radiation sources;

deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation;

imparting the projection beam of radiation with a cross-section pattern; and

projecting the patterned projection beam of radiation onto a target portion of a substrate.

15. The method according to claim 14, wherein each of said source radiation beams is a pulsed radiation beam including a periodic series of radiation pulses, and wherein the projection beam of radiation includes a series of discrete radiation pulses, each radiation pulse in the projection beam of radiation being formed of a respective pulse from a respective source radiation beam.

16. The method according to claim 15, wherein each of the source radiation beams is of substantially the same wavelength of radiation, and wherein each of the periodic series of radiation pulses has substantially the same repetition frequency.

17. The method as claimed in claim 14, wherein the projection beam comprises a periodic series of groups of radiation pulses, and wherein each group of pulses is separated by a time period sufficient to allow a change in configuration of at least one of said controllable elements.

18. The method as claimed in claim 17, wherein each group of pulses comprises one pulse from each source radiation beam.

19. The method as claimed in claim 17, wherein the intensity of at least one pulse within each group is controlled, so as to ensure the total radiation intensity of each group is within predetermined limits.

20. A flat panel display manufactured according to the method of claim 14.