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Lithographic apparatus, device manufacturing method and device manufactured thereby

  • US 20060139660A1
  • Filed: 12/05/2005
  • Published: 06/29/2006
  • Est. Priority Date: 08/24/2000
  • Status: Active Grant
First Claim
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1. A lithographic projection apparatus comprising:

  • a support structure for supporting a patterning device, the patterning device serving to pattern a beam of radiation according to a desired pattern;

    a substrate table for holding a substrate;

    a projection system for projecting the patterned beam onto a target portion of the substrate; and

    a displacement measuring system for measuring a position of a moveable object comprising one of the support structure and the substrate table, wherein the displacement measuring system comprises an encoder system for measuring two degrees of freedom of the moveable object relative to a reference frame, and wherein the displacement measurement system also comprises a Z-sensor for measuring at least another degree of freedom of the moveable object relative to the reference frame.

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