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Method and apparatus for creating a phase step in mirrors used in spatial light modulator arrays

  • US 20060139729A1
  • Filed: 12/27/2004
  • Published: 06/29/2006
  • Est. Priority Date: 12/27/2004
  • Status: Active Grant
First Claim
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1. A method, comprising:

  • (a) creating a plurality of cavities on a first major side of a wafer;

    (b) patterning a second major side of the wafer with an etch-resistant layer; and

    (c) etching portions of the wafer not patterned with the etch-resist layer to create openings between the first major side and the second major side of the wafer.

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