Titania coatings by cvd at atmospheric pressure
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Abstract
A method for deposition of titania, and titania-containing, thin films by CVD, using an atmospheric pressure glow discharge plasma as a major source of reaction, which leads to film properties, and film growth rates, normally only achievable (by atmospheric pressure CVD) with significantly higher substrate temperatures.
44 Citations
48 Claims
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1-24. -24. (canceled)
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25. A method for depositing titania, or titania-containing as thin films on a substrate, the method comprising:
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using an atmospheric pressure glow discharge plasma as a major source of reaction to improve film properties and film growth rates, when the substrate is heated at a temperature below 250°
C.,introducing a reactive titania CVD precursor which has been pre-vaporised into the introduced gas flow into a gas flowing through a coating region. - View Dependent Claims (26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48)
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Specification