Process monitoring device for sample processing apparatus and control method of sample processing apparatus

• US 20060142888A1
• Filed: 02/17/2006
• Published: 06/29/2006
• Est. Priority Date: 03/05/2001
• Status: Active Grant

• Current Assignee: Hideyuki Yamamoto, Hiroyuki Kitsunai, Junichi Tanaka, Kazue Takahashi, Shoji Ikuhara
• Original Assignee: Hideyuki Yamamoto, Hiroyuki Kitsunai, Junichi Tanaka, Kazue Takahashi, Shoji Ikuhara
• Inventors: Tanaka, Junichi, Ikuhara, Shoji, Yamamoto, Hideyuki, Takahashi, Kazue, Kitsunai, Hiroyuki
• Granted Patent: US 7,158,848 B2
• Time in Patent Office: Days
• US Class Current: 700/108
• CPC Class Codes: G05B 19/41875 characterised by quality surveillance of production
• CPC Class Codes: G05B 21/02 electric
• CPC Class Codes: G05B 2219/32053 Adjust work parameter as function of other cell
• CPC Class Codes: G05B 2219/32182 If state of tool, product deviates from standard, adjust system, feedback
• CPC Class Codes: G05B 23/0221 Preprocessing measurements, e.g. data collection rate adjustment; Standardization of measurements; Time series or signal analysis, e.g. frequency analysis or wavelets; Trustworthiness of measurements; Indexes therefor; Measurements using easily measured parameters to estimate parameters difficult to measure; Virtual sensor creation; De-noising; Sensor fusion; Unconventional preprocessing inherently present in specific fault detection methods like PCA-based methods
• CPC Class Codes: Y02P 90/02 Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Abstract

A plasma processing apparatus for processing a sample within a vacuum vessel, including: a plurality of sensors for detecting plural kinds of information relating to a processing state of the sample as monitor data; data selecting means for selecting a detection time range of the monitor data thus detected which is used for monitoring the plasma processing apparatus; a signal filter for converting the monitor data within the selected detection time range into an effective signal; a model expression unit for generating a predicted value of a patterned physical-shape of a sample based on the effective signal; and a display screen for displaying the patterned physical-shape predicted value; wherein the display screen displays the patterned physical-shape predicted value without measuring a patterned shape after processing of the sample.

Claims

1. A plasma processing apparatus for processing a sample within a vacuum vessel, comprising:

a plurality of sensors for detecting plural kinds of information relating to a processing state of the sample as monitor data;

data selecting means for selecting a detection time range of the monitor data thus detected which is used for monitoring the plasma processing apparatus;

a signal filter for converting the monitor data within the selected detection time range into an effective signal;

a model expression unit for generating a predicted value of a patterned physical-shape of a sample based on the effective signal; and

a display screen for displaying the patterned physical-shape predicted value;

wherein the display screen displays the patterned physical-shape predicted value without measuring a patterned shape after processing of the sample.