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Apparatus and method for wet-etching

  • US 20060144822A1
  • Filed: 12/23/2005
  • Published: 07/06/2006
  • Est. Priority Date: 12/30/2004
  • Status: Abandoned Application
First Claim
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1. A wet-etching apparatus, comprising:

  • a first etching chamber;

    a second etching chamber; and

    a cleaning chamber located between the first and second etching chambers;

    wherein residue produced in the first etching chamber is removed in the cleaning chamber.

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