Apparatus and method for wet-etching
First Claim
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1. A wet-etching apparatus, comprising:
- a first etching chamber;
a second etching chamber; and
a cleaning chamber located between the first and second etching chambers;
wherein residue produced in the first etching chamber is removed in the cleaning chamber.
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Abstract
A wet-etching apparatus (20) includes a first etching chamber (213), a second etching chamber (215), and a cleaning chamber (214) located between the first and second etching chambers. The wet-etching apparatus includes the cleaning chamber disposed between the first and second etching chambers. After being etched in the first etching chamber and before being conveyed to the second etching chamber, a glass substrate is cleaned, so that the residue thereon is removed. Because no resultant blocks the wet-etching reaction, the glass substrate is etched uniformly. Thus, the quality and the yield of the wet-etching process are improved.
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Citations
13 Claims
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1. A wet-etching apparatus, comprising:
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a first etching chamber;
a second etching chamber; and
a cleaning chamber located between the first and second etching chambers;
wherein residue produced in the first etching chamber is removed in the cleaning chamber. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A wet-etching method, comprising:
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wet-etching a substrate a first time;
cleaning the substrate to remove residue from the substrate, the residue being produced in the first etching chamber; and
wet-etching the substrate a second time. - View Dependent Claims (8, 9, 10, 11, 12, 13)
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Specification