Radiation exposure apparatus comprising a gas flushing system
First Claim
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1. A method of manufacturing a device comprising:
- patterning a beam of radiation;
projecting the patterned beam of radiation via a projection system onto a target portion of a substrate comprising a radiation-sensitive layer; and
flowing a flushing gas from a first gas outlet positioned outside a circumference of said target portion to a space between said projection system and said substrate, wherein, during said projecting, at least part of said flushing gas flows towards said target portion.
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Abstract
An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for removing gas from an area between the projection system and the substrate.
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Citations
26 Claims
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1. A method of manufacturing a device comprising:
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patterning a beam of radiation;
projecting the patterned beam of radiation via a projection system onto a target portion of a substrate comprising a radiation-sensitive layer; and
flowing a flushing gas from a first gas outlet positioned outside a circumference of said target portion to a space between said projection system and said substrate, wherein, during said projecting, at least part of said flushing gas flows towards said target portion. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method comprising:
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patterning a beam of radiation;
projecting the patterned beam of radiation via a projection system onto a target portion of a substrate comprising one or more resist layers for manufacturing one or more color filter layers; and
providing an air flow in the space between said target portion and said projection system to extract gases emanating from said target portion during said projecting. - View Dependent Claims (15)
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16. A lithographic projection apparatus comprising:
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a radiation system constructed and arranged to supply a projection beam of radiation;
a support structure constructed and arranged to support a patterning structure, the patterning structure being constructed and arranged to pattern the projection beam according to a desired pattern;
a substrate support constructed and arranged to support a substrate;
a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate; and
a gas flushing system constructed and arranged to extract gas from the space between the substrate support and the projection system. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24)
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25. A gas flushing system constructed for use in a radiation exposure apparatus, the gas flushing system being designed to only extract gas and not supply gas.
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26. A gas flushing system constructed for use in a radiation exposure apparatus, the system comprising one or more openings covered with a transparent material.
Specification