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Systems and methods for minimizing scattered light in multi-SLM maskless lithography

  • US 20060146308A1
  • Filed: 01/06/2005
  • Published: 07/06/2006
  • Est. Priority Date: 01/06/2005
  • Status: Active Grant
First Claim
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1. A system, comprising one or more pattern generating devices having a pattern generating configuration;

  • a projection optics system for directing light from said one or more pattern generating devices to a substrate or work surface; and

    an aperture within said projection optics system having a profile that matches the pattern generating configuration.

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