Systems and methods for minimizing scattered light in multi-SLM maskless lithography
First Claim
1. A system, comprising one or more pattern generating devices having a pattern generating configuration;
- a projection optics system for directing light from said one or more pattern generating devices to a substrate or work surface; and
an aperture within said projection optics system having a profile that matches the pattern generating configuration.
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Abstract
The present invention is directed to a lithography system in which scattered light from a pattern generator, having one or more pattern generating devices, is blocked from an object, such as a wafer or display. The system includes a pattern generator with multiple pattern generating devices, a projection system for directing light from the pattern generating device, and an aperture located at or near an object window. The aperture has a profile that matches the configuration of the pattern generating devices. A method for blocking scattered light in a lithography system using multiple pattern generating devices is also provided.
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Citations
17 Claims
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1. A system, comprising
one or more pattern generating devices having a pattern generating configuration; -
a projection optics system for directing light from said one or more pattern generating devices to a substrate or work surface; and
an aperture within said projection optics system having a profile that matches the pattern generating configuration. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A projection optics system for use with one or more pattern generating devices having a pattern generating configuration, comprising
one or more optical elements for directing light; an aperture having a profile with openings that correspond to locations of the one or more pattern generating devices. - View Dependent Claims (11, 12, 13)
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14. A method, comprising:
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(a) generating a beam of radiation;
(b) patterning portions of the beam of radiation;
(c) projecting the patterned beam of radiation towards a substrate; and
(d) blocking scattered light from the beam of radiation from the object. - View Dependent Claims (15, 16, 17)
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Specification