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Electrically reconfigurable photolithography mask for semiconductor and micromechanical substrates

  • US 20060147845A1
  • Filed: 01/05/2005
  • Published: 07/06/2006
  • Est. Priority Date: 01/05/2005
  • Status: Abandoned Application
First Claim
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1. An apparatus comprising a reticle for photolithography having an electronically reconfigurable mask.

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