Method of forming gate insulation layers of different characteristics
First Claim
Patent Images
1. A method, comprising:
- forming a first dielectric layer having a first specified characteristic on a first semiconductor region and a second semiconductor region, said first and second semiconductor regions formed on a substrate;
forming a mask layer above said substrate to expose a first portion of said first dielectric layer located above said first semiconductor region and to cover a second portion of said first dielectric layer located above said second semiconductor region;
removing said first portion of said first dielectric layer; and
forming a second dielectric layer with a second specified characteristic on said first semiconductor region, said first characteristic differing from said second characteristic and said mask layer preventing said second dielectric layer from forming on said second portion of said first dielectric layer.
2 Assignments
0 Petitions
Accused Products
Abstract
The present invention describes a method for forming different types of gate insulation layers, wherein the formation of one type of gate insulation layer is highly decoupled from the formation of the other type of gate insulation layer. Thus, in some embodiments, critical oxidation processes may finely be tuned on an individual basis. This is accomplished by providing a mask layer that may substantially prevent any impact on an initially made insulation layer during a subsequent manufacturing process of a second gate insulation layer.
20 Citations
21 Claims
-
1. A method, comprising:
-
forming a first dielectric layer having a first specified characteristic on a first semiconductor region and a second semiconductor region, said first and second semiconductor regions formed on a substrate;
forming a mask layer above said substrate to expose a first portion of said first dielectric layer located above said first semiconductor region and to cover a second portion of said first dielectric layer located above said second semiconductor region;
removing said first portion of said first dielectric layer; and
forming a second dielectric layer with a second specified characteristic on said first semiconductor region, said first characteristic differing from said second characteristic and said mask layer preventing said second dielectric layer from forming on said second portion of said first dielectric layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
-
Specification