Plasma process device
First Claim
1. A plasma processing apparatus comprising:
- a processing chamber for performing plasma-assisted processing;
microwave introducing means having an interior space in which a first standing wave of a microwave is formed by means of resonance, the microwave introducing means directing the microwave to said processing chamber;
a dielectric provided between said processing chamber and said microwave introducing means and adjacent said interior space for directing the microwave into said processing chamber, a second standing wave of the microwave being formed within the dielectric by means of resonance; and
a slot antenna having an aperture through which the microwave is passed from said interior space to said dielectric, the slot antenna covering a side of said dielectric that faces said interior space, wherein said aperture is generally located at a point where the position of a loop in the first standing wave orthogonally projected to said slot antenna coincides with the position of a loop in the second standing wave orthogonally projected to said slot antenna.
1 Assignment
0 Petitions
Accused Products
Abstract
A plasma processing apparatus includes: a processing chamber; an inlet waveguide having an interior space in which a first standing wave of a microwave is formed by means of resonance; a dielectric within which a second standing wave of the microwave is formed by means of resonance; and a slot antenna having a slot through which the microwave is passed from the interior space to the dielectric. The slot is generally located at a point where the position of a loop in the first standing wave orthogonally projected to the slot antenna coincides with the position of a loop in the second standing wave orthogonally projected to the slot antenna. The present invention provides a plasma processing apparatus that improves the propagation efficiency of a microwave passed through an aperture of the slot antenna, thereby allowing microwave energy to be efficiently introduced into a processing chamber.
17 Citations
3 Claims
-
1. A plasma processing apparatus comprising:
-
a processing chamber for performing plasma-assisted processing;
microwave introducing means having an interior space in which a first standing wave of a microwave is formed by means of resonance, the microwave introducing means directing the microwave to said processing chamber;
a dielectric provided between said processing chamber and said microwave introducing means and adjacent said interior space for directing the microwave into said processing chamber, a second standing wave of the microwave being formed within the dielectric by means of resonance; and
a slot antenna having an aperture through which the microwave is passed from said interior space to said dielectric, the slot antenna covering a side of said dielectric that faces said interior space, wherein said aperture is generally located at a point where the position of a loop in the first standing wave orthogonally projected to said slot antenna coincides with the position of a loop in the second standing wave orthogonally projected to said slot antenna. - View Dependent Claims (2, 3)
-
Specification