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Method of making a vertical light emitting diode

  • US 20060154392A1
  • Filed: 01/11/2005
  • Published: 07/13/2006
  • Est. Priority Date: 01/11/2005
  • Status: Active Grant
First Claim
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1. A method of fabricating a semiconductor vertical light emitting diode (VLED) device, comprising:

  • forming multi-layer epitaxial structure of the VLED device that includes an n-gallium nitride (n-GaN) layer, an active layer, and an p-gallium nitride (p-GaN) layer; and

    providing a plurality of balls on a surface of the n-GaN layer of the VLED device.

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