Method of making a vertical light emitting diode
First Claim
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1. A method of fabricating a semiconductor vertical light emitting diode (VLED) device, comprising:
- forming multi-layer epitaxial structure of the VLED device that includes an n-gallium nitride (n-GaN) layer, an active layer, and an p-gallium nitride (p-GaN) layer; and
providing a plurality of balls on a surface of the n-GaN layer of the VLED device.
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Abstract
Methods are disclosed for forming a vertical semiconductor light emitting diode (VLED) device having an active layer between an n-doped layer and a p-doped layer; and securing a plurality of balls on a surface of the n-doped layer of the VLED device.
90 Citations
44 Claims
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1. A method of fabricating a semiconductor vertical light emitting diode (VLED) device, comprising:
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forming multi-layer epitaxial structure of the VLED device that includes an n-gallium nitride (n-GaN) layer, an active layer, and an p-gallium nitride (p-GaN) layer; and
providing a plurality of balls on a surface of the n-GaN layer of the VLED device. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33)
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34. A method comprising:
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forming a vertical light emitting diode (VLED) device having an active layer between an n-doped layer and a p-doped layer; and
securing a plurality of balls on a surface of the n-doped layer of the VLED device. - View Dependent Claims (35, 36, 37, 38, 39, 40, 41, 43, 44)
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42. A method comprising:
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forming, for a vertical light emitting diode (VLED) device, a MQW active layer between an n-GaN layer and a p-GaN layer;
securing a plurality of balls to the n-GaN layer; and
forming opposing electrodes in electrical communication, respectively, with the n-GaN layer and the p-GaN layer.
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Specification