Capacitively coupled plasma reactor with magnetic plasma control

• US 20060157201A1
• Filed: 02/23/2006
• Published: 07/20/2006
• Est. Priority Date: 05/22/2002
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Ye, Yan, Hoffman, Daniel J., Barnes, Michael, Miller, Matthew L., Ishikawa, Tetsuya, Chae, Heeyeop, Yang, Jang Gyoo
• Granted Patent: US 7,955,986 B2
• Time in Patent Office: Days
• US Class Current: 156/345.460
• CPC Class Codes: H01J 37/32091 the radio frequency energy being capacitively coupled to the plasma
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32623 Mechanical discharge control means
• CPC Class Codes: H01J 37/3266 Magnetic control means

Abstract

A plasma reactor includes a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within the chamber and facing the ceiling for supporting a planar workpiece, the workpiece support and the ceiling together defining a processing region between the workpiece support and the ceiling. Process gas inlets furnish a process gas into the chamber. A plasma source power electrode is connected to an RF power generator for capacitively coupling plasma source power into the chamber for maintaining a plasma within the chamber. The reactor further includes at least a first overhead solenoidal electromagnet adjacent the ceiling, the overhead solenoidal electromagnet, the ceiling, the side wall and the workpiece support being located along a common axis of symmetry. A current source is connected to the first solenoidal electromagnet and furnishes a first electric current in the first solenoidal electromagnet whereby to generate within the chamber a magnetic field which is a function of the first electric current, the first electric current having a value such that the magnetic field increases uniformity of plasma ion density radial distribution about the axis of symmetry near a surface of the workpiece support.

Claims

1. A plasma reactor comprising:

a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within said chamber and facing said ceiling for supporting a planar workpiece, said workpiece support and said ceiling together defining a processing region between said workpiece support and said ceiling;

process gas inlets for furnishing process gas into said chamber;

an RF power generator and a plasma source power electrode connected to said RF power generator for capacitively coupling plasma source power into said chamber for maintaining a plasma within said chamber;

at least a first overhead solenoidal electromagnet adjacent said ceiling, said overhead solenoidal electromagnet, said ceiling, said side wall and said workpiece support being located along a common axis of symmetry; and

a current source connected to said first solenoidal electromagnet and furnishing a first electric current in said first solenoidal electromagnet whereby to generate within said chamber a magnetic field which is a function of said first electric current, said first electric current having a value such that said magnetic field increases uniformity of plasma ion density radial distribution about said axis of symmetry near a surface of said workpiece support.

2. The reactor of claim 1 wherein said first solenoidal electromagnet is outside of said chamber and faces an external surface of said ceiling.

3. The reactor of claim 1 wherein said plasma source power electrode comprises one of:

(a) said workpiece support;

(b) said ceiling.

4. The reactor of claim 1 wherein said electric current is a D.C. electric current and said magnetic field is a static magnetic field.

5. The reactor of claim 1 further comprising:

a second overhead solenoidal electromagnet approximately concentric with said first overhead solenoidal electromagnet and connected to said current source, said current source furnishing a second electric current to said second solenoidal electromagnet to generate magnetic flux in said second solenoidal electromagnetic that contributes to said magnetic field, whereby said magnetic field is determined by both said first and second electric currents in said first and second solenoidal electromagnets, said first and second electric currents having values such that said magnetic field increases said uniformity of plasma ion density radial distribution.

6. The reactor of claim 4 wherein said first and second solenoidal electromagnets are outside of said chamber and face an external surface of said ceiling.

7. The reactor of claim 6 wherein:

said first solenoidal electromagnet has a diameter on the order of a diameter of said workpiece support and is at a first axial distance above said workpiece support;

said second solenoidal electromagnet has a diameter less than the diameter of said first solenoidal electromagnet and is at a second axial distance above said workpiece support greater than said first axial distance.

8. The reactor of claim 7 wherein:

said first solenoidal electromagnet produces greater radial magnetic pressure on plasma over a greater radial area near a surface of said workpiece support than said second solenoidal electromagnet;

said second solenoidal electromagnet produces magnetic pressure predominantly over a radial area confined near the center of a surface of said workpiece support.

9. The reactor of claim 8 wherein:

said first and second currents constitute a first set of currents whenever plasma is directed primarily at a wafer on said wafer support;

said first and second currents constitute a second set of currents different from said first set of currents whenever plasma is directed toward said ceiling.

10. The reactor of claim 9 wherein said first and second currents constitute a third set of currents different from said first and second sets of currents whenever plasma is directed toward said side wall.

14. The reactor of claim 8 wherein:

said plurality of electric currents constitute a first set of currents whenever plasma is directed primarily at a wafer on said wafer support;

said plurality of electric currents constitute a second set of currents different from said first set of currents whenever plasma is directed toward said ceiling.

15. The reactor of claim 14 wherein said plurality of electric currents constitute a third set of currents different from said first and second sets of currents whenever plasma is directed toward said side wall.

16. The reactor of claim 15 wherein in at least one of said sets of currents, at least one of the currents has a polarity opposite to polarities of others of said currents.

11. A plasma reactor comprising:

a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within said chamber and facing said ceiling for supporting a planar workpiece, said workpiece support and said ceiling together defining a processing region between said workpiece support and said ceiling;

process gas inlets for furnishing process gas into said chamber;

an RF power generator and an electrode connected to said RF power generator for capacitively coupling plasma source power into said chamber for maintaining a plasma;

a plurality of overhead solenoidal electromagnets adjacent said ceiling for generating a combined magnetic field in said chamber comprising a sum of individual magnetic fields produced by respective ones of said plurality of solenoidal electromagnets, a plurality of electric currents flowing in said solenoidal electromagnets, said combined magnetic field being determined by said plurality of electric currents, wherein said overhead solenoid, said ceiling, said side wall and said workpiece support are located along a common axis of symmetry; and

a current source connected to said plurality of solenoidal electromagnets and furnishing said plurality of electric currents to said solenoidal electromagnets, said electric currents having respective values such that said magnetic field increases uniformity of plasma ion density radial distribution about said axis of symmetry near a surface of said workpiece support.

12. The reactor of claim 11 wherein said plurality of solenoidal electromagnets are concentric and are arranged in order of ascending diameter and descending axial height above said ceiling.

13. The reactor of claim 12 wherein:

the outermost ones of said electromagnets exert a correspondingly greater radial magnetic pressure on plasma across a greater radial area than the innermost ones of said electromagnets;

the innermost ones of said electromagnets exert radial magnetic pressure on plasma within a region confined near the center of said chamber.

17. The reactor of claim 11 wherein said plurality of electric currents are D.C. electric currents and said combined magnetic field is a static magnetic field.

18. The reactor of claim 11 further comprising:

plural solenoidal side magnets having plural axes of symmetry perpendicular to and generally extending from said common axis of symmetry, said plural solenoidal side magnets for generating a rotating magnetic field in said processing region.

19. The reactor of claim 18 wherein said plural solenoidal side magnets generally face said side wall while said plural overhead solenoidal magnets face said ceiling.

20. The reactor of claim 19 wherein said plural solenoidal side magnets are plural side solenoidal electromagnets, said reactor further comprising a current generator for applying respective low frequency sinusoidal currents of different respective phases to said plural side solenoidal electromagnets whereby to generate said rotating magnetic field.

21. A plasma reactor comprising:

a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within said chamber and facing said ceiling for supporting a planar workpiece, said workpiece support and said ceiling together defining a processing region between said workpiece support and said ceiling;

process gas inlets for furnishing process gas into said chamber;

an RF power generator and a plasma source power electrode connected to said RF power generator for capacitively coupling plasma source power into said chamber for maintaining a plasma;

a plurality of overhead solenoidal magnets adjacent said ceiling having a combined static magnetic field in said chamber comprising a sum of individual static magnetic fields produced by respective ones of said plurality of solenoidal magnets, wherein said overhead solenoid, said ceiling, said side wall and said workpiece support are located along a common axis of symmetry; and

wherein said combined magnetic field increases uniformity of plasma ion density radial distribution about said axis of symmetry near a surface of said workpiece support.

22. The reactor of claim 21 wherein said plurality of solenoidal magnets are concentric and are arranged in order of ascending diameter and descending axial height above said ceiling.

23. The reactor of claim 21 wherein:

the outermost ones of said magnets exert a correspondingly greater radial magnetic pressure on plasma across a greater radial area than the innermost ones of said magnets;

the innermost ones of said magnets exert radial magnetic pressure on plasma within a region confined near the center of said chamber.

24. A plasma reactor comprising:

a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within said chamber and facing said ceiling for supporting a planar workpiece, said workpiece support and said ceiling together defining a processing region between said workpiece support and said ceiling;

process gas inlets for furnishing process gas into said chamber;

an RF power generator and a plasma source power electrode connected to said RF power generator for capacitively coupling plasma source power into said chamber for maintaining a plasma within said chamber;

an overhead solenoidal magnet outside of said chamber and facing an external surface of said ceiling, said overhead solenoidal magnet, said ceiling, said side wall and said workpiece support being located along a common axis of symmetry; and

said overhead solenoidal magnet having a D.C. magnetic field within said chamber that has a sufficient radial component to increase uniformity of plasma ion density radial distribution about said axis of symmetry near a surface of said workpiece support.

25. A plasma reactor comprising:

a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within said chamber and facing said ceiling for supporting a planar workpiece, said workpiece support and said ceiling together defining a processing region between said workpiece support and said ceiling;

process gas inlets for furnishing process gas into said chamber;

an RF power generator and an electrode connected to said RF power generator for capacitively coupling plasma source power into said chamber for maintaining a plasma;

a plurality of overhead solenoidal electromagnets adjacent said ceiling for generating a combined magnetic field in said chamber comprising a sum of individual magnetic fields produced by respective ones of said plurality of solenoidal electromagnets, a plurality of electric currents flowing in said solenoidal electromagnets, said combined magnetic field being determined by said plurality of electric currents, wherein said overhead solenoid, said ceiling, said side wall and said workpiece support are located along a common axis of symmetry;

said plurality of solenoidal electromagnets being concentric and being arranged in order of ascending diameter and descending axial height above said ceiling; and

a plasma steering controller connected to said plurality of solenoidal electromagnets and furnishing said plurality of electric currents to said solenoidal electromagnets, said plurality of electric currents constituting a first set of currents whenever plasma is directed primarily at a wafer on said wafer support and constituting a second set of currents different from said first set of currents whenever plasma is directed toward said ceiling.

26. The reactor of claim 25 wherein:

the outermost ones of said electromagnets exert a correspondingly greater radial magnetic pressure on plasma across a greater radial area than the innermost ones of said electromagnets;

the innermost ones of said electromagnets exert radial magnetic pressure on plasma within a region confined near the center of said chamber.

27. The reactor of claim 25 wherein said plurality of electric currents constitute a third set of currents different from said first and second sets of currents whenever plasma is directed toward said side wall.

28. The reactor of claim 27 wherein in at least one of said sets of currents, at least one of the currents has a polarity opposite to polarities of others of said currents.

29. The reactor of claim 25 wherein said plurality of electric currents are D.C. electric currents and said combined magnetic field is a static magnetic field.

30. The reactor of claim 25 further comprising:

plural solenoidal side magnets having plural axes of symmetry perpendicular to and generally extending from said common axis of symmetry, said plural solenoidal side magnets for generating a rotating magnetic field in said processing region.

31. The reactor of claim 30 wherein said plural solenoidal side magnets generally face said side wall while said plural overhead solenoidal magnets face said ceiling.

32. The reactor of claim 30 wherein said plural solenoidal side magnets are plural side solenoidal electromagnets, said reactor further comprising a current generator for applying respective low frequency sinusoidal currents of different respective phases to said plural side solenoidal electromagnets whereby to generate said rotating magnetic field.