Power semiconductor device with endless gate trenches
First Claim
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1. A power semiconductor device comprising:
- a drift region of a first conductivity;
a base region of a second conductivity over said drift region;
a plurality of endless trenches extending through said base region to said drift region;
a gate insulation layer formed in each endless trench adjacent said base region; and
a gate electrode residing in each endless trench.
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Abstract
A power semiconductor device which includes endless gate trenches.
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Citations
19 Claims
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1. A power semiconductor device comprising:
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a drift region of a first conductivity;
a base region of a second conductivity over said drift region;
a plurality of endless trenches extending through said base region to said drift region;
a gate insulation layer formed in each endless trench adjacent said base region; and
a gate electrode residing in each endless trench. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A power semiconductor device comprising:
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a plurality of spaced endless gate trenches each including two opposing and spaced trenches connected to one another by connecting trenches to form an endless gate trench;
a gate insulation liner lining at least the walls of said endless trenches;
an endless gate electrode disposed within each endless trench; and
a voltage supply bus electrically connected to each of said endless gate electrodes. - View Dependent Claims (15, 16, 17, 18, 19)
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Specification