Projection exposure apparatus, projection exposure method, and method for producing device
First Claim
Patent Images
1. A projection exposure apparatus which transfers a pattern formed on a mask onto a substrate through a liquid, the projection exposure apparatus comprising:
- a projection optical system which projects an image of the pattern onto the substrate; and
an electricity removal unit which removes electricity from the liquid to be supplied to a space between the projection optical system and a surface of the substrate.
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Abstract
A projection exposure apparatus transfers a pattern formed on a mask onto a substrate via a projection optical system. The projection exposure apparatus includes electricity removal units which removes electricity from a liquid supplied to a space between the projection optical system and the surface of a substrate. This makes it possible to prevent destruction of the circuit pattern or malfunction of the device which would otherwise caused by charging of the liquid.
37 Citations
19 Claims
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1. A projection exposure apparatus which transfers a pattern formed on a mask onto a substrate through a liquid, the projection exposure apparatus comprising:
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a projection optical system which projects an image of the pattern onto the substrate; and
an electricity removal unit which removes electricity from the liquid to be supplied to a space between the projection optical system and a surface of the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 18)
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8. A projection exposure apparatus which transfers a pattern formed on a mask onto a substrate through a liquid, the projection exposure apparatus comprising:
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a projection optical system which projects an image of the pattern onto the substrate; and
an electricity removal unit which removes electricity from the liquid intervened between the projection optical system and a surface of the substrate. - View Dependent Claims (9, 10, 11, 12, 19)
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13. A projection exposure method for irradiating a mask with an exposure light beam and projecting a pattern formed on the mask onto a substrate through a liquid with a projection optical system, the projection exposure method comprising:
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a step of removing electricity from the liquid; and
a step of supplying the liquid to a space between the projection optical system and a surface of the substrate. - View Dependent Claims (14, 15, 16, 17)
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Specification