Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processes
First Claim
1. A method for depositing material on a microfeature workpiece, comprising:
- placing the microfeature workpiece in a plasma chamber;
detecting a plasma in the plasma chamber while the microfeature workpiece is in the plasma chamber; and
controlling processing of the microfeature workpiece in the plasma chamber based at least in part on the detection of the plasma.
1 Assignment
0 Petitions
Accused Products
Abstract
Systems and methods for detecting plasmas and/or controlling microfeature workpiece deposition processes are disclosed. A method in accordance with one embodiment includes placing a microfeature workpiece in a plasma chamber, detecting a plasma in the plasma chamber while the microfeature workpiece is in the plasma chamber, and controlling processing of the microfeature workpiece in the plasma chamber based at least in part on the detection of the plasma. A controller in accordance with another embodiment of the invention can be configured to receive an indication of plasma initiation, track an exposure time based on the indication of plasma initiation, and compare the exposure time to a target value. If the exposure time meets or exceeds the target value, the controller can direct the plasma to be extinguished. If an indication that the plasma has been extinguished is received prior to the target exposure time being met, the controller can halt tracking the exposure time, await an indication of plasma re-initiation, and restart tracking the exposure time when the indication of plasma re-initiation is received.
126 Citations
49 Claims
-
1. A method for depositing material on a microfeature workpiece, comprising:
-
placing the microfeature workpiece in a plasma chamber;
detecting a plasma in the plasma chamber while the microfeature workpiece is in the plasma chamber; and
controlling processing of the microfeature workpiece in the plasma chamber based at least in part on the detection of the plasma. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
-
-
15. A method for controlling a plasma process, comprising:
-
automatically detecting a plasma in a plasma chamber;
exposing a target to the plasma; and
automatically controlling a time during which the target is exposed to the plasma based at least in part on the detection of the plasma. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23)
-
-
24. A method for depositing material on a microfeature workpiece, comprising:
-
placing the microfeature workpiece in a plasma chamber;
reducing a pressure in the plasma chamber;
igniting constituents in the plasma chamber;
detecting ignition of constituents in the plasma chamber based on a first signal received from a photosensitive diode; and
(a) detecting extinction of the plasma in the plasma chamber while the microfeature workpiece is in the plasma chamber, based on a second signal received from the photosensitive diode; and
determining an amount of time during which the microfeature workpiece is exposed to the ignited plasma based at least in part on the detected initiation of the plasma and the detected extinction of the plasma;
or(b) extinguishing the ignited constituents after a threshold period of time has elapsed;
or(c) both (a) and (b). - View Dependent Claims (25)
-
-
26. A method for controlling plasma exposure time, comprising:
-
receiving an indication of plasma initiation;
tracking an exposure time based at least in part on the indication of plasma initiation;
comparing the exposure time to a target value for exposure time;
if the exposure time meets or exceeds the target value, directing the plasma to be extinguished; and
if an indication that the plasma has been extinguished is received prior to the exposure time meeting or exceeding the target value, then (a) halting tracking the exposure time;
(b) awaiting an indication of plasma re-initiation; and
(c) restarting tracking the exposure time when the indication of plasma re-initiation is received. - View Dependent Claims (27, 28, 29)
-
-
30. A computer-readable medium for controlling operation of a plasma chamber, comprising:
-
a receiver portion configured to receive a signal corresponding to the presence of a plasma in a plasma chamber;
a timer portion configured to determine a period of time during which the plasma is present in the plasma chamber, based at least in part of the received signal; and
a control portion configured to direct a control signal that controls a power source used to initiate the plasma. - View Dependent Claims (31, 32, 33, 34, 35)
-
-
36. An apparatus for applying material to a microfeature workpiece, comprising:
-
a plasma chamber coupleable to a source of gas;
a support positioned within the plasma chamber and configured to carry a microfeature workpiece;
an energy source positioned at least proximate to the plasma chamber to impart energy to atoms within the plasma chamber;
a detector positioned to detect the presence of a plasma within the plasma chamber; and
a controller operatively coupled to the energy source and the detector to control operation of the energy source based at least in part on a signal received from the detector. - View Dependent Claims (37, 38, 39, 40, 41, 42)
-
-
43. An apparatus for applying material to a microfeature workpiece, comprising:
-
a plasma chamber coupleable to a source of gas;
a support positioned within the plasma chamber and configured to carry a microfeature workpiece;
an energy source positioned at least proximate to the plasma chamber to impart energy to atoms within the plasma chamber;
a photodetector positioned to detect the presence of a plasma within the plasma chamber based on photon emissions from the plasma; and
a controller operatively coupled to the energy source and the detector to control operation of the energy source based at least in part on a signal received from the detector, the controller being configured to;
receive an indication of plasma initiation;
track an exposure time based on the indication of plasma initiation;
compare the exposure time to a target value for exposure time;
if the exposure time meets or exceeds the target value, direct the plasma to be extinguished; and
if an indication that the plasma has been extinguished is received prior to the exposure time meeting or exceeding the target value, then (a) halt tracking the exposure time;
(b) await an indication of plasma re-initiation; and
(c) restart tracking the exposure time when the indication of plasma re-initiation is received. - View Dependent Claims (44, 45)
-
-
46. An apparatus for applying material to a microfeature workpiece, comprising:
-
a plasma chamber coupleable to a source of gas;
a support positioned within the plasma chamber and configured to carry a microfeature workpiece;
an energy source positioned at least proximate to the plasma chamber to impart energy to atoms within the plasma chamber;
detection means for detecting the presence of a plasma within the plasma chamber; and
control means operatively coupled to the energy source and the detector means to control operation of the energy source based at least in part on a signal received from the detection means. - View Dependent Claims (47, 48, 49)
-
Specification