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Substrate having pattern and method for manufacturing the same, and semiconductor device and method for manufacturing the same

  • US 20060170077A1
  • Filed: 01/19/2006
  • Published: 08/03/2006
  • Est. Priority Date: 01/28/2005
  • Status: Active Grant
First Claim
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1. A substrate having a film pattern comprising:

  • a film in which silicon and oxygen are combined and an inactive group is combined with the silicon, formed on the substrate; and

    a film pattern formed over the film.

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